Ceramic heater
A ceramic heater for a semiconductor substrate process includes a plate and a shaft. The plate includes a first base and a second base bonded to the first base. Defined on a mounting surface of the first base are: a first region having a surface contacting with a mounted substrate; a purge groove provided in the portion covered with the substrate and surrounds the first region; and a second region having a surface surrounding the purge groove. The first base has: an adsorber configured to adsorb the mounted substrate onto the surface of the first region; and multiple purge holes each penetrating from the bottom surface of the purge groove to the lower surface of the first base. The purge groove is supplied with a purge gas through the multiple purge holes. The surface of the second region is located lower than that of the first region.
1. A ceramic heater for a semiconductor substrate process comprising:
a mounting plate on which the substrate is mounted; and
a supporter configured to support the mounting plate, wherein
the mounting plate includes:
a first base made of a ceramic sintered body and having a mounting surface on which the substrate is mounted, and having a lower surface provided on an opposite side to the mounting surface; and
a second base made of a ceramic sintered body and having an upper surface bonded to the lower surface of the first base, and having a lower surface provided on an opposite side to the upper surface,
the supporter is made of a ceramic sintered body, is bonded to the lower surface of the second base, and includes a first penetration hole penetrating from one end of the supporter to the other end of the supporter,
a first region, a first groove and a second region are defined on the mounting surface of the first base,
the first region has a first surface contacting with the mounted substrate;
the first groove is provided in a portion covered with the substrate and surrounds the first region; and
the second region has a second surface directly adjacent to and surrounding the first groove,
the first base has:
an adsorber configured to adsorb the mounted substrate onto the first surface; and
a plurality of holes each penetrating from a bottom surface of the first groove to the lower surface of the first base,
at least one of the upper surface of the second base and the lower surface of the first base is provided with a second groove connected to each of the plurality of holes,
the second base has a second penetration hole connected to the second groove and to the first penetration hole,
the first groove is supplied with an inert gas through the first penetration hole, the second penetration hole, the second groove, and the plurality of holes,
the entirety of the second surface of the second region is located lower than the first surface of the first region and higher than a bottom surface of the first groove, and
wherein a portion of the second surface of the second region is covered with the mounted substrate,
wherein an annular convex portion surrounds the second surface of the second region, and wherein an inside wall of the convex portion has a tapered surface that surrounds a space formed between the mounted substrate and the second surface of the second region so as to openly enlarge outward from the bottom upward.
2. The ceramic heater according to claim 1 , wherein
as the adsorber, the first base has a third groove provided in the first surface, and
the third groove is evacuated to hold the substrate on the first region.
3. The ceramic heater according to claim 2 , further comprising:
a heating element provided in the first base; and
an embedded electrode provided between the mounting surface of the first base and the heating element.
4. The ceramic heater according to claim 1 , wherein
as the adsorber, the first base has an annular protrusion, a bottom surface surrounded by the annular protrusion and a plurality of embosses provided on the bottom surface in the first region, the annular protrusion and the plurality of embosses supporting the substrate, and
a space formed by the substrate, the annular protrusion and the bottom surface is evacuated to hold the substrate on the first region.
5. The ceramic heater according to claim 4 , further comprising:
a heating element provided in the first base; and
an embedded electrode provided between the mounting surface of the first base and the heating element.
6. The ceramic heater according to claim 1 , wherein
as the adsorber, an electrode is embedded in the first base, and
the electrode generates an electrostatic adsorption force at least on the first surface of the first region to hold the substrate on the first region.
7. The ceramic heater according to claim 6 , further comprising
a heating element provided in the first base, wherein
the electrode is provided between the mounting surface of the first base and the heating element.
8. The ceramic heater according to claim 1 , wherein
when the substrate has a diameter of 300 mm,
the first groove has a width ranging between 0.5 mm and 4 mm,
the first groove has a depth ranging between 0.025 mm and 0.25 mm,
a distance between the first surface of the first region and the second surface of the second region ranges between 0.01 mm and 1 mm,
each of the plurality of holes has a diameter ranging between 0.25 mm and 2 mm,
a diameter of a circle connecting the respective centers of the plurality of holes to each other ranges between 280 mm and 299 mm, and
the number of the holes is 8 to 48.
9. The ceramic heater according to claim 8 , further comprising:
a heating element provided in the first base; and
an embedded electrode provided between the mounting surface of the first base and the heating element.
10. The ceramic heater according to claim 1 , further comprising:
a heating element provided in the first base; and
an embedded electrode provided between the mounting surface of the first base and the heating element.