Semiconductor device fabrication using spacers
View Patent ↗A process for fabrication of a semiconductor device that includes forming a first trench in a semiconductor body, forming spaced spacers in the first trench, and forming a narrower second trench at the bottom of the first trench using the spacers as a mask.
1. A method for fabricating a semiconductor device comprising:
forming a first trench mask over one surface of a semiconductor body, said first trench mask including an opening therein;
removing semiconductor material from said semiconductor body from a bottom of said opening in said mask to obtain a first trench having a first width and extending to a first depth inside said semiconductor body, said first trench including sidewalls. and a bottom;
forming spacers inside said first trench, each spacer extending from said bottom of said first trench along a respective sidewall thereof, said spacers being spaced from one another at said bottom of said first trench;
removing semiconductor from said bottom of said first trench using said spacers as a second trench mask to obtain a second trench having a second width and extending to a second depth below said first depth inside said semiconductor body, said second width being less than said first width, said second trench including sidewalls and a bottom;
covering said sidewalls and said bottom of said second trench with an insulation body;
forming a field electrode inside said second trench, said source field electrode extending into said first trench; and
depositing an oxide layer over said source field electrode, said spacers and said first trench.
2. The method of claim 1 , wherein said spacers are comprised of silicon dioxide.
3. The method of claim 1 , wherein said spacers are comprised of insulated gate electrodes.
4. The method of claim 1 , further comprising removing said spacers, and then forming an insulated gate between said source field electrode and a respective sidewall of said first trench.
5. The method of claim 1 , wherein said sidewalls of said second trench are vertically oriented.
6. The method of claim 1 , wherein said sidewalls of said second trench taper toward said bottom of said second trench.
7. The method of claim 1 , wherein said first trench mask comprises silicon nitride.
8. The method of claim I, wherein said forming said spacers inside said first trench comprises depositing silicon dioxide inside said first trench to cover said bottom and said sidewalls thereof, and removing a portion of said silicon dioxide that lies over said bottom of said first trench to obtain spacers that are spaced at said bottom of said first trench.
9. The method of claim 1 , wherein said forming said spacers inside said first trench comprises oxidizing said sidewalls of said first trench, forming spaced polysilicon gate electrodes inside said first trench along said oxidized sidewalls thereof.
10. The method of claim 1 , wherein said covering step comprises oxidizing said sidewalls and said bottom of said second trench.
11. The method of claim 1 , wherein said covering step comprises depositing an insulation body on said sidewalls and said bottom of said second trench.
12. A method for fabricating a semiconductor device comprising:
etching a first trench into a semiconductor body using a trench mask;
etching a second trench into a bottom of said first trench by forming spacers within said first trench, each spacer extending along a respective sidewall thereof and being used as a second trench mask;
filling said second trench with an insulated source field electrode, said source field electrode extending vertically into said first trench; and
removing said spacers and forming therein insulated gate electrodes by depositing a gate oxide and filling with a polysilicon gate electrode.
13. The method of claim 12 , wherein said spacers are comprised of silicon dioxide.
14. The method of claim 12 , wherein the sidewalls of said second trench are vertically oriented.
15. The method of claim 12 , wherein the sidewalls of said second trench taper toward the bottom of said second trench.
16. The method of claim 12 , wherein said forming said spacers inside said first trench comprises depositing silicon dioxide inside said first trench to cover the bottom and sidewalls thereof to obtain spacers that are spaced at said bottom of said first trench.