Microphone with reduced parasitic capacitance
View Patent ↗A MEMS microphone has an SOI wafer, a backplate formed in a portion of the SOI wafer, and a diaphragm adjacent to and movable relative to the backplate. The backplate has at least one trench that substantially circumscribes a central portion of the backplate.
1. A method of forming a MEMS microphone, the method comprising:
providing a silicon-on-insulator (SOI) wafer;
forming a backplate in a portion of the SOI wafer, the backplate having at least one trench that substantially circumscribes a central portion of the backplate; and
forming a diaphragm adjacent to and movable relative to the backplate.
2. The method of claim 1 wherein the diaphragm has an outer portion and the at least one trench substantially aligns with the outer portion of the diaphragm.
3. The method of claim 1 further comprising:
forming springs in an outer portion of the diaphragm, the springs coupling the diaphragm to the SOI wafer, the diaphragm having an area radially inward from the springs and the backplate having an area radially inward from the at least one trench, the diaphragm area and the backplate area having substantially the same size.
4. The method of claim 1 further comprising:
forming springs in an outer portion of the diaphragm, the springs coupling the diaphragm to the SOI wafer, the diaphragm having an area radially inward from the springs and the backplate having an area radially inward from the at least one trench, wherein the diameter of the backplate area is about 12 μm less than or greater than the diameter of the diaphragm area.
5. The method of claim 1 wherein the backplate has an area radially inward from the at least one trench, the method further comprising:
forming a plurality of trenches that substantially circumscribe a central portion of the backplate; and
forming tethers in the backplate, each tether between two adjacent trenches, the tethers coupling the backplate area to the SOI wafer.
6. The method of claim 1 wherein the at least one trench is filled with a dielectric material.
7. The method of claim 1 further comprising forming additional trenches in the backplate radially outward from the at least one trench.
8. The method of claim 7 further comprising:
forming springs in an outer portion of the diaphragm, the springs coupling the diaphragm to the SOI wafer, wherein the additional trenches in the backplate are aligned near the sides of the springs.
9. A MEMS microphone comprising:
a silicon-on-insulator (SOI) wafer;
a backplate formed in a portion of the SOI wafer, the backplate having at least one trench that substantially circumscribes a central portion of the backplate; and
a diaphragm adjacent to and movable relative to the backplate.
10. The MEMS microphone of claim 9 wherein the diaphragm has an outer portion and the at least one trench substantially aligns with the outer portion of the diaphragm.
11. The MEMS microphone of claim 9 wherein the diaphragm has springs in an outer portion of the diaphragm, the springs coupling the diaphragm to the SOI wafer, the diaphragm having an area radially inward from the springs and the backplate having an area radially inward from the at least one trench, the diaphragm area and the backplate area having substantially the same size.
12. The MEMS microphone of claim 9 wherein the diaphragm has springs in an outer portion of the diaphragm, the springs coupling the diaphragm to the SOI wafer, the diaphragm having an area radially inward from the springs and the backplate having an area radially inward from the at least one trench, wherein the diameter of the backplate area is about 12 μm less than or greater than the diameter of the diaphragm area.
13. The MEMS microphone of claim 9 wherein the backplate has an area radially inward from the at least one trench, the microphone further comprising:
a plurality of trenches that substantially circumscribe a central portion of the backplate; and
tethers, each tether between two adjacent trenches, the tethers coupling the backplate area to the SOI wafer.
14. The MEMS microphone of claim 9 wherein the at least one trench is filled with a dielectric material.
15. The MEMS microphone of claim 9 wherein the backplate has additional trenches formed radially outward from the at least one trench.
16. The MEMS microphone of claim 15 wherein the diaphragm has springs in an outer portion of the diaphragm, the springs coupling the diaphragm to the SOI wafer, wherein the additional trenches in the backplate are aligned near the sides of the springs.
17. A method of forming a MEMS microphone, the method comprising:
forming a backplate in a portion of a silicon-on-insulator (SOI) wafer;
forming a diaphragm adjacent to and movable relative to the backplate;
forming springs in an outer portion of the diaphragm, the springs coupling the diaphragm to the SOI wafer, the diaphragm having an area radially inward from the springs; and
forming at least one trench in the backplate that substantially circumscribes a central portion of the backplate, the at least one trench substantially aligning with a periphery of the diaphragm area.
18. The method of claim 17 wherein the backplate has an area radially inward from the at least one trench, the method further comprising:
forming a plurality of trenches that substantially circumscribe a central portion of the backplate; and
forming tethers in the backplate, each tether between two adjacent trenches, the tethers coupling the backplate area to the SOI wafer.
19. The method of claim 17 wherein the at least one trench is filled with a dielectric material.
20. A MEMS microphone formed according to the process of claim 17 .