Cleaning method, cleaning apparatus and electro optical device
View Patent ↗A cleaning apparatus of organic substances attached to a vapor-deposition mask for low molecular weight organic EL devices comprises a first stage for treating a vapor-deposition mask with a derivative of pyrrolidone, a second stage for rinsing the vapor-deposition mask with water, and a third stage for rinsing the vapor-deposition mask with flowing water. The cleaning apparatus also comprises a fourth stage for treating the vapor-deposition mask with ethanol, a fifth stage for drying the vapor-deposition mask, and a carrying means that carries the vapor-deposition mask to each stage in sequence. It is desirable to adopt N-methyl-2-pyrrolidone as the derivative of pyrrolidone.
1. A cleaning method of removing an organic substance attached to a vapor deposition mask of an electro-optical device, comprising, in order:
exposing the vapor deposition mask to a derivative of pyrrolidone to remove the organic substance;
exposing the vapor deposition mask to water; and
exposing the vapor deposition mask to ethanol.
2. The cleaning method according to claim 1 wherein the derivative of pyrrolidone comprises N-methyl-2-pyrrolidone.
3. The cleaning method according to claim 1 wherein the vapor deposition mask is cleaned at room temperature.
4. The cleaning method according to claim 1 wherein the vapor deposition mask is cleaned while applying ultrasonic waves to the derivative of pyrrolidone.
5. The cleaning method of claim 1 , wherein the electro-optical device is an organic electro luminescence device.
6. A cleaning method of removing an organic substance attached to a vapor deposition manufacturing device of an electro- optical device, comprising:
exposing the vapor deposition manufacturing device to a derivative of pyrrolidone to remove the organic substance;
wherein the organic substance includes a metallo - organic complex, the metallo - organic complex being one of copper phthalocyanine and tris ( 8 - hydroxyquinolinato ) aluminum.
7. The cleaning method of claim 6 , wherein the derivative of pyrrolidone is selected from the group consisting of 2 - pyrrolidone, N - methyl - 2 - pyrrolidone, and N - vinyl - pyrrolidone.
8. The cleaning method of claim 6 , wherein the vapor deposition manufacturing device is a vapor deposition mask.
9. The cleaning method of claim 6 , wherein the vapor deposition manufacturing device comprises a protection plate that prevents evaporated material from attaching to the chamber, the evaporated material being the organic substance.
10. The cleaning method according to claim 6 , further comprising the step of exposing the vapor deposition manufacturing device to water after removing the organic substance.
11. The cleaning method according to claim 6 , wherein the vapor deposition manufacturing device is cleaned at room temperature.
12. The cleaning method according to claim 6 , wherein the vapor deposition manufacturing device is cleaned while applying ultrasonic waves.
13. The cleaning method according to claim 6 , wherein the derivative of pyrrolidone comprises N- methyl - 2 - pyrrolidone.
14. The cleaning method of claim 7 , wherein the derivative of pyrrolidone is N- methyl - 2 - pyrrolidone.
15. The cleaning method according to claim 10 , further comprising the step of exposing the vapor deposition manufacturing device to ethanol after exposing the manufacturing device to water.