Method for manufacturing workpieces with ion-etched surface
View Patent ↗Planetary carriers ( 22 ) for workpieces mounted on a carousel ( 19 ) are provided within a vacuum chamber. A source ( 24 ) for a cloud comprising ions (CL) is provided so that a central axis (A CL ) of the cloud intercepts the rotary axis (A 20 ) of the carousel ( 19 ). The cloud (CL) has an ion density profile at the moving path (T) of planetary axes (A 22 ) which drops to 50% of the maximum ion density at a distance from the addressed center axis (A CL ) which is at most half the diameter of the planetary carriers ( 22 ). When workpieces upon the planetary carriers ( 22 ) are etched by the cloud comprising ions material which is etched off is substantially not redeposited on neighboring planetary carriers but rather ejected towards the wall of the vacuum chamber.
1. A method for manufacturing workpieces, at least a part of a surface of said workpieces being etched including etched by ion impact, comprising:
providing a carousel base drivingly rotatable about a carousel axis;
providing along a periphery of and on said carousel base at least two planetary carriers, each drivingly rotatable about a planetary axis parallel to said carousel axis;
generating a cloud comprising ions and having, in a cross-sectional plane perpendicular to said carousel axis and perpendicular to said planetary axis, a center axis of said cloud in a center of an area of maximum ion density;
directing said center axis so as to intersect with said carousel axis, in said cross-sectional plane;
applying at least one workpiece to be etched on each of said planetary carriers, each of said planetary carriers defining by rotating about its planetary axis a diameter with respect to such planetary axis;
said cloud comprising ions having an ion density dropping to 50% of maximum ion density of said cloud at a distance from said center axis which is at most equal to 50% of said diameter, in said cross-sectional plane, and at a locus of a moving path of said planetary axes;
rotating said carousel base and said planetary carriers about said respective axes; and
etching the workpieces as the workpiece are moved into and through said cloud.
2. The method of claim 1 , wherein said cloud is generated substantially linearly extended in a height direction parallel to the planetary axes and perpendicular to said center axis.
3. The method of claim 1 , comprising applying said workpieces eccentrically with respect to the respective planetary axis.
4. The method of claim 1 , further comprising additionally preventing re-deposition of material momentarily etched from said workpieces to others of said workpieces by mutual shielding.
5. The method of claim 1 , further comprising further concentrating said etching by selectively applying a higher negative bias voltage to one or more than one workpieces being momentarily etched than to workpieces momentarily not being etched.
6. The method of claim 1 , said generating comprising shaping said cloud by a diaphragm, wherein said shaping is carried out through an electrically floating metallic diaphragm or through a dielectric diaphragm or through an anode diaphragm.
7. The method of claim 1 , said generating comprising applying a magnetic field along said cloud.
8. The method of claim 1 , thereby generating said cloud as a plasma.
9. The method of claim 1 , said distance being at most equal to a quarter of said diameter.
10. The method of claim 3 , further comprising the step of rotating each workpiece about a workpiece axis.
11. A method for manufacturing workpieces, at least a part of a surface of said workpieces being etched including etched by ion impact, comprising:
providing a carousel base drivingly rotatable about a carousel axis;
providing along a periphery of and on said carousel base at least two planetary carriers, each drivingly rotatable about a planetary axis parallel to said carousel axis;
generating a cloud comprising ions and having, in a cross-sectional plane perpendicular to said carousel axis and perpendicular to said planetary axis, a center axis of said cloud in a center of an area of maximum ion density;
directing said center axis so as to intersect with said carousel axis, in said cross-sectional plane;
applying at least one workpiece to be etched on each of said planetary carriers, each of said planetary carriers defining by rotating about its planetary axis a diameter with respect to such planetary axis;
said cloud comprising ions having an ion density dropping to 50% of maximum ion density of said cloud at a distance from said center axis which is at most equal to 50% of said diameter, in said cross-sectional plane, and at a locus of a moving path of said planetary axes;
rotating said carousel base and said planetary carriers about said respective axes; and
etching the workpieces as the workpiece are moved into and through said cloud,
wherein said cloud is generated substantially linearly extended in a height direction parallel to the planetary axes and perpendicular to said center axis.