Solid-state image pickup device and electronic apparatus
View Patent ↗A solid-state image pickup device includes a semiconductor substrate having a light-incident surface, a plurality of pixels arranged on the light-incident surface, a photodiode arranged in each of the pixels, an insulating film arranged on the semiconductor substrate and configured to cover the photodiodes, wirings embedded in the insulating film, an etching stopper film distant from the lowermost wiring among the wirings, arranged adjacent to the semiconductor substrate, configured to cover at least a region where each of the photodiodes is arranged, and composed of silicon carbide, a trench arranged above each of the photodiodes so as to reach the etching stopper film, and an optical waveguide with which each of the trenches is filled, the optical waveguide having a higher refractive index than the insulating film.
1. A solid-state image pickup device comprising:
a semiconductor substrate having a light-incident surface;
a plurality of pixels arranged on the light-incident surface;
a photodiode arranged in each of the pixels;
an insulating film arranged on the semiconductor substrate and configured to cover the photodiodes;
wirings containing copper embedded in the insulating film, each of the wirings being covered with a coating configured to prevent diffusion of the copper, each of the coatings including (a) a barrier metal layer configured to cover a lower surface and side surfaces of each of the wirings and (b) a diffusion preventing film configured to cover an upper surface of each of the wirings;
a film which makes etching stop, said film which makes etching stop being distant from a lowermost wiring among the wirings;
a trench arranged above each of the photodiodes so as to reach the film which makes etching stop, said trench disposed so as not to pass entirely through the film which makes etching stop; and
a structure with which each of the trenches is filled, the structure having a higher refractive index than the insulating film.
2. The solid-state image pickup device according to claim 1 , further comprising a silicon oxide film arranged between the semiconductor substrate and the film which makes etching stop.
3. The solid-state image pickup device according to claim 1 , wherein each of the structures includes a passivation film configured to cover the inner wall of each of the trenches, and a buried layer arranged on each of the passivation films and configured to be buried in the corresponding trench.
4. An electronic apparatus comprising:
a solid-state image pickup device;
an optical system configured to guide incident light to a light-incident section; and
a signal processing circuit configured to process an output signal from the solid-state image pickup device, wherein the solid-state image pickup device includes a semiconductor substrate having a light-incident surface;
a plurality of pixels arranged on the light-incident surface;
a photodiode arranged in each of the pixels;
an insulating film arranged on the semiconductor substrate and configured to cover the photodiodes;
wirings containing copper embedded in the insulating film, each of the wirings being covered with a coating configured to prevent diffusion of the copper, each of the coatings including (a) a barrier metal layer configured to cover a lower surface and side surfaces of each of the wirings and (b) a diffusion preventing film configured to cover an upper surface of each of the wirings;
a film which makes etching stop, said film which makes etching stop being distant from a lowermost wiring among the wirings;
a trench arranged above each of the photodiodes so as to reach the film which makes etching stop, said trench disposed so as not to pass entirely through the film which makes etching stop; and
a structure with which each of the trenches is filled, the structure having a higher refractive index than the insulating film.
5. The solid-state image pickup device according to claim 1 , wherein the film which makes etching stop is composed of silicon carbide.
6. The solid-state image pickup device according to claim 1 , wherein the structure comprises an optical waveguide.
7. The electronic apparatus according to claim 4 , wherein the film which makes etching stop is composed of silicon carbide.
8. The electronic apparatus according to claim 4 , wherein the structure comprises an optical waveguide.