Thin-film device, method for manufacturing the same, and electronic apparatus

1. A method for manufacturing a thin-film device, comprising:

forming a separation layer on a substrate;

forming a support layer of mainly clay containing silicate mineral having a layered crystal structure on the separation layer;

forming a thin-film functional member on the support layer;

applying an energy to the separation layer to reduce the adhesion between the substrate and the support layer; and

removing the substrate from the support layer and the thin-film functional member.

2. The method according to claim 1 , wherein the support layer is formed by a cast method.

3. The method according to claim 1 , further comprising forming a protective layer to cover the support layer after forming the support layer and before forming the thin-film functional member.

4. The method according to claim 3 , wherein the support layer is formed in an inner region part from the outer edges of the substrate in a plan view, and the protective layer is formed so as to cover the surface of the support layer not in contact with the separation layer and the sides of the support layer.

5. The method according to claim 3 , wherein the protective layer includes at least one of a silicon oxynitride film and an aluminium oxide film.

6. A thin-film device comprising:

a support layer mainly made of clay containing silicate mineral having a layered crystal structure;

a protective layer covering the support layer, the protective layer covering a surface and sides of the support layer; and

a thin-film functional member disposed on the protective layer.

7. The thin-film device according to claim 6 , wherein the protective layer includes at least one of a silicon oxynitride film and an aluminium oxide film.

8. An electronic apparatus comprising the thin-film device as set forth in claim 6 .