Method for decontaminating surfaces of nuclear plants which have been contaminated with alpha emitters
A method for decontaminating nuclear plant surfaces, which have been contaminated with alpha emitters, is carried out subsequently to a decontamination process which is aimed at the removal of oxide layers. The surfaces are treated with an aqueous solution which contains a cationic or zwitterionic surfactant and oxalic acid. At least a part of the solution, after having acted on a surface, is conducted across an ion exchanger.
1. A method for decontaminating nuclear plant surfaces having been contaminated with alpha emitters, the method comprising the following steps:
performing a decontamination in which oxide layers present on said surfaces have been at least partially removed:
treating said surfaces with an aqueous solution containing oxalic acid and a surfactant having a zwitterionic surfactant selected from an amino acid of a general formula HOOC—R—NH 2 where R is any organic substituent, or an N-oxide of a general formula R1-(NO)(R2)(R3) with an aliphatic radical R1 having from 4 to 24 C atoms and aliphatic radicals R2 and R3 each having from 1 to 10 C atoms; and
feeding at least some of said solution through an ion exchanger after it has acted on said surfaces.
2. The method according to claim 1 , which further comprises providing said ion exchanger as a cation exchanger.
3. The method according to claim 1 , which further comprises providing said oxalic acid in a concentration of from 250 ppm to 15,000 mg/l.
4. The method according to claim 1 , wherein said partial removal of said oxide layer present on the surface is removed with a cleaning solution containing oxalic acid.
5. The method according to claim 1 , wherein the aqueous solution further contains a cationic surfactant, the cationic surfactant being a primary amine of a general formula R4-NH 2 where R4 is an aliphatic radical including from 8 to 24 C atoms.
6. The method according to claim 1 , wherein said amino acid has an aliphatic radical R including from 4 to 24 C atoms.
7. The method according to claim 5 , wherein said amine is dimethyl amine octadecyl N-oxide.
8. The method according to claim 1 , which further comprises carrying out the method with a surfactant concentration of from 50 ppm to 5,000 mg/l.
9. The method according to claim 1 , which further comprises carrying out the method at a temperature of from 30° C. to 100° C.
10. The method according to claim 1 , which further comprises providing the radical R1 of the N-oxide with from 12 to 24 C atoms and providing each of the radicals R2 and R3 of the N-oxide with from 1-3 C atoms.