Distributed dielectric barrier discharge reactor
View Patent ↗A plasma reactor consisting of a plurality of elements placed between two or more plasma generating electrodes is presented. Said elements consisting of surfaces, conducting, and/or dielectric which allow for the dielectric isolation of the electrodes from each other and creating a plurality of dielectrically isolated spaces for plasma generation. This plasma reactor achieves a high surface area, with low capacitance allowing simplified construction and is suitable for high frequency operation.
1. A plasma generation device comprising:
a first unit plasma generation electrode and a spaced-apart second unit plasma generation electrode, each operable to connect to an electric power source supplying a voltage difference therebetween, each electrode coated at least in part with dielectric material;
a plurality of dielectric elements formed from dielectric material positioned in a stack spaced apart from and not in contact with the first unit plasma generation electrode and the second unit plasma generation electrode and positioned therebetween, the dielectric elements being spaced apart from one another to define a plurality of plasma generating gaps between adjacent pairs of dielectric elements and between the dielectric elements and the first and second unit plasma generation electrodes, the dielectric elements having the same length as the first and second plasma generation electrodes, wherein the dielectric elements do not include conductive material; and
a plurality of dielectric spacers creating a single gap having the height of a single dielectric spacer between adjacent pairs of dielectric elements, between the dielectric elements and the first unit plasma generation electrode, and between the dielectric elements and the second unit plasma generation electrode such that plasma is generated in the gaps, wherein there is only a first dielectric spacer and a second dielectric spacer between the first unit plasma generation electrode and the dielectric element adjacent the first unit plasma generation electrode and positioned at opposing edges of the dielectric material of the first unit plasma generation electrode, only a first dielectric spacer and a second dielectric spacer between the second unit plasma generation electrode and the dielectric element adjacent the second unit plasma generation electrode and positioned at opposing edges of the dielectric material of the second unit plasma generation electrode, and only a first dielectric spacer and a second dielectric spacer between adjacent pairs of dielectric elements positioned at opposing edges of the adjacent pairs of dielectric elements, such that outer edges of the first dielectric spacer and the second dielectric spacer between adjacent pairs of dielectric elements are aligned with outer edges of the adjacent pairs of dielectric elements.
2. The plasma generation device according to claim 1 , wherein each plasma generating gap includes an inlet at one end of the plasma generation device, an outlet at an opposing end of the plasma generation device, and a gas flow path therebetween, such that the inlet, the gas flow path, and the outlet are aligned with one another.
3. The plasma generation device according to claim 2 , wherein gas flow is linear along the gas flow path from the inlet to the outlet.
4. The plasma generation device according to claim 1 , wherein the first unit plasma generation electrode is roughly planar and forms a first tab that extends outward from a first side of the plasma generation device and the second unit plasma generation electrode is roughly planar and forms a second tab that extends outward from a second side of the plasma generation device, opposite the first side.
5. The plasma generation device according to claim 4 , wherein the first and second tabs are connected to the electric power source.