Shock electrode line

1. A shock electrode line ( 5 ) comprising:

a proximal end configured to connect to an implantable device ( 3 ) wherein said implantable device is configured to generate shock pulses;

a distal segment having a shock electrode ( 7 );

wherein an area ratio of the shock electrode to a surface area of the shock electrode line ( 5 ) is not constant over a longitudinal extent of the shock electrode ( 7 );

wherein the shock electrode ( 7 ) is configured as a tube with a conductive structure arranged on a surface of the shock electrode ( 7 );

wherein the conductive structure has a non-constant layer height in a direction away from said tube along the shock electrode ( 7 ) so that the layer height is different at different locations along the shock electrode ( 7 ) to provide higher and lower hardness values along the shock electrode ( 7 ) respectively wherein said shock electrode is configured with at least one preferential bend direction having said lower hardness value;

wherein the conductive structure has a coil ( 78 ), whose pitch is not constant; and,

wherein the conductive structure has at least two layers ( 72 , 73 ) with a different conductivity wherein said at least two layers comprise a first layer arranged on a surface of the tube and a second layer arranged on top of said first layer.

2. The shock electrode line ( 5 ) according to claim 1 , wherein the area ratio of the shock electrode to the surface area of the shock electrode line increases toward the distal segment of the shock electrode ( 7 ).

3. The shock electrode line ( 5 ) according to claim 1 , wherein the conductive structure is formed by a laser cutting process.

4. A shock electrode arrangement ( 1 ) comprising a shock electrode line ( 5 ) according to claim 1 and wherein the implantable device ( 3 ) comprises a housing configured to act as a counter electrode.

5. The shock electrode arrangement ( 1 ) according to claim 4 , wherein the shock electrode line ( 1 ) comprises a sensor ( 9 ) configured to sense tissue action potentials and/or organ action potentials and further comprises a stimulation electrode ( 11 ) for low-energy energetic stimulation.

6. A shock electrode line ( 5 ) according to claim 1 wherein said first layer is tantalum arranged on the surface of the tube and said second layer is biocompatible platinum or a platinum-iridium alloy arranged on top of said first layer.

7. A shock electrode line ( 5 ) according to claim 1 , wherein the conductive structure is arranged on a layer of shape memory alloy ( 74 ).