System and method for modulating pressure in an alkali-vapor cell
View Patent ↗The present invention provides a system and method for achieving a calibration-free primary atomic clock standard operating at the 0-0 transition free-atom frequency, thus creating a primary frequency standard, with attributes that include scalable to chip-scale dimensions and power consumption.
1. An integrated system for providing a chip-scale primary frequency standard, the system comprising:
an alkali vapor cell comprising at least two chambers having a common buffer-gas, wherein said buffer-gas nominally of the zero-pressure-shift mixture;
a heating element bonded to the alkali vapor cell;
a pressure modulator bonded to the alkali vapor cell to modulate pressure in the alkali vapor cell causing a change in frequency shift; and
a feedback control loop for detecting the change in frequency shift in the alkali vapor cell and providing a signal to the heating element to modify temperature of the alkali vapor cell to compensate for the change in frequency shift so as to maintain the buffer-gas mixture at a zero pressure-shift point.
2. The system of claim 1 wherein said pressure modulator is a micro-electro-mechanical element for modulating the pressure by changing volume of the cell.
3. The system of claim 1 wherein said pressure modulator is a liquid metal piston for modulating the pressure by changing volume of the cell.
4. The system of claim 3 wherein said liquid metal piston is an alkali piston, wherein said piston functions to provide the alkali metal into the cell and to modulate the pressure in the cell.
5. The system of claim 1 wherein said pressure modulator is MEMs pump for modulating the pressure by changing amount of the buffer gas in the cell.
6. The system of claim 1 wherein said one of the two chambers having temperature different than the other of the two chambers.
7. The system of claim 1 wherein said first chamber is an alkali source chamber and the second chamber is an interrogation chamber.
8. The system of claim 7 wherein said cell comprising a third chamber, wherein said pressure modulator and the heating element are bonded to said third chamber.
9. The system of claim 7 wherein the source chamber has a temperature lower than the interrogation chamber.
10. The system of claim 7 further comprising a laser aligned to the second chamber for emitting laser beam into the cell.
11. The system of claim 7 further comprising a second heating element integrated to the laser pump to maintain optical frequency when said laser is intensity modulated.
12. The system of claim 7 further comprising a second heating element integrated on the source chamber wherein DC photodetector signal is used in feedback to maintain constant optical absorption and constant alkali density.
13. The system of claim 1 further comprising a lock-in detector for detecting the change in frequency shift due to the change in the pressure in the cell.
14. A system comprising:
an integrated system comprising an alkali vapor cell comprising at least two chambers having a common buffer-gas, wherein said buffer-gas nominally of the zero-pressure-shift mixture; a heating element bonded to the alkali vapor cell; a pressure modulator bonded to the alkali vapor cell to modulate pressure in the alkali vapor cell causing a change in frequency shift; and a feedback control loop for detecting the change in frequency shift in the alkali vapor cell and providing a signal to the heating element to modify temperature of the alkali vapor cell to compensate for the change in frequency shift so as to maintain the buffer-gas mixture at a zero pressure-shift point;
a device having an input coupled to said integrated system and being operatively responsive to said input.
15. The system of claim 14 wherein said device comprise at least one of a global positioning system and a global positioning denied system.