Microlens alignment procedures in CMOS image sensor design
View Patent ↗A method for aligning a microlens array in a sensor die to resolve non-symmetric brightness distribution and color balance of the image captured by the sensor die. The method includes performing a pre-simulation to simulate a microlens array alignment in a silicon die and to determine a shrink-factor and de-centering values, calculating the error in a real product's alignment in process and image offset, performing a post simulation based on offset calculation on the real product and re-design of the microlens alignment, and repeating the steps of calculating the error and performing the post-simulation until a satisfactory brightness distribution is obtained. The sensor die has sensor pixels, each pixel comprising a photodiode and a microlens for directing incoming light rays to the photodiode, wherein optical axis of the microlens is shifted with respect to optical axis of the photodiode by a preset amount determined by at least one iteration of alignment process.
1. A method, comprising:
capturing an image using a first image sensor having a first microlens array formed using a first photo-mask;
generating one or more correction parameters by evaluating the captured image;
creating a second photo-mask based on the first photo-mask and the one or more correction parameters; and
using the second photo-mask to form a second microlens array of a second image sensor.
2. The method of claim 1 , further comprising:
using a collimated white light source to produce the image captured by the first image sensor.
3. The method of claim 2 , wherein said evaluating the captured image comprises evaluating a uniformity of brightness distribution of the captured image.
4. The method of claim 2 , wherein:
said generating one or more correction parameters comprises determining a shrink-factor and a de-centering value based on a uniformity of brightness distribution of the captured image; and
said creating a second photo-mask comprises:
shrinking the first photo-mask based on the shrink-factor; and
de-centering the first photo-mask based on the de-centering value.
5. The method of claim 1 , wherein:
said generating one or more correction parameters comprises determining a shrink-factor from the captured image; and
said creating a second photo-mask comprises shrinking the first photo-mask based on the shrink-factor.
6. The method of claim 1 , wherein:
said generating one or more correction parameters comprises determining a de-centering value from the captured image; and
said creating a second photo-mask comprises de-centering the first photo-mask based on the de-centering value.
7. The method of claim 1 , wherein:
said generating one or more correction parameters comprises determining a shrink-factor and a de-centering value from the captured image; and
said creating a second photo-mask comprises:
shrinking the first photo-mask based on the shrink-factor; and
de-centering the first photo-mask based on the de-centering value.
8. An article of manufacture including a computer-readable medium having instructions stored thereon that, in response to execution by a computing device, cause the computing device to perform operations comprising:
receiving image data captured by a first image sensor having a first microlens array formed using a first photo-mask design;
calculating an error in alignment between the first image sensor and the first microlens array based on the image data;
determining a shrink-factor based on the calculated error in alignment; and
generating a second photo-mask design that corresponds to the first photo-mask design shrunken by the shrink-factor.
9. The article of manufacture of claim 8 , wherein said calculating an error in alignment comprises evaluating a uniformity of brightness distribution of the image data.
10. The article of manufacture of claim 8 , wherein said generating a second photo-mask design comprises shrinking the first photo-mask design based on the shrink-factor.
11. The article of manufacture of claim 8 , wherein:
said calculating an error in alignment comprises determining a de-centering value from the image data; and
said generating a second photo-mask design comprises de-centering the first photo-mask design based on the de-centering value.
12. The article of manufacture of claim 8 , wherein:
said calculating an error in alignment comprises determining a de-centering value from the image data; and
said generating a second photo-mask design comprises:
shrinking the first photo-mask design based on the shrink-factor; and
de-centering the first photo-mask design based on the de-centering value.
13. A method, comprising:
using a first photo-mask design to form a first microlens array on a first sensor die;
determining a de-centering value based on image data from the first image sensor;
de-centering the first photo-mask design based on the de-centering value to obtain a second photo-mask design; and
using the second photo-mask design to form a second microlens array on a second sensor die.
14. The method of claim 13 , further comprising:
using a collimated white light source to produce an image;
capturing the image with the first image sensor; and
generating the image data based on the captured image.
15. The method of claim 14 , wherein said determining a de-centering value comprises evaluating a uniformity of brightness distribution of the captured image.
16. The method of claim 13 , further comprising:
determining a shrink-factor based on the image data; and
shrinking the first photo-mask design based on the shrink-factor to obtain the second photo-mask design.
17. A system, comprising:
an image source configured to produce an image; and
a computing device configured to:
receive image data generated by a first image sensor in response to capturing the image;
determine, based on the image data, one or more correction parameters for a first photo-mask design used to form a first microlens array on the first image sensor; and
create a second photo-mask design for a second microlens array on a second image sensor based on the first photo-mask design and the determined one or more correction parameters.
18. The system of claim 17 , wherein the image source comprises a collimated white light source.
19. The system of claim 18 , wherein the computing device is further configured to determine the one or more correction parameters based on a uniformity of brightness distribution of the captured image.
20. The system of claim 18 , wherein the computing device is further configured to:
determine a shrink-factor and a de-centering value of the one or more correction parameters based on a uniformity of brightness distribution of the captured image;
shrink the first photo-mask based on the shrink-factor; and
de-center the first photo-mask based on the de-centering value.
21. The system of claim 17 , wherein the computing device is further configured to:
determine a shrink-factor of the one or more correction parameters from the captured image; and
shrink the first photo-mask design based on the shrink-factor.
22. The system of claim 17 , wherein the computing device is further configured to:
determine a de-centering value of the one or more correction parameters from the captured image; and
de-center the first photo-mask design based on the de-centering value.
23. The system of claim 17 , wherein the computing device is further configured to:
determine a shrink-factor and a de-centering value of the one of more correction parameters from the captured image;
shrink the first photo-mask based on the shrink factor; and
de-center the first photo-mask based on the de-centering value.