Method for manufacturing information aquiring semiconductor device
View Patent ↗A method for manufacturing a semiconductor device for detecting a physical amount distribution, the semiconductor device comprising unit components arrayed in a predetermined order, the unit components each including a unit signal generation portion for detecting an electromagnetic wave and outputting the corresponding unit signal. A diffraction grating is provided on the incident light side of a spectral image sensor, the diffraction grating including scatterers, slits, and scatterers disposed in that order. An electromagnetic wave is scattered by the scatterers to produce diffracted waves, and by using the fact that interference patterns between the diffracted waves change with wavelengths, signals are detected for respective wavelengths by photoelectric conversion elements in each photodiode group.
1. A method for manufacturing a semiconductor device for detecting a physical amount distribution, the semiconductor device comprising unit components in an array, the unit components each including a unit signal generation portion for detecting an electromagnetic wave and outputting a corresponding unit signal, the method comprising:
alternately laminating p-type and n-type semiconductor layers in a curved form to form respective wavelength detecting portions for detecting the electromagnetic wave for each of the respective wavelength components separated by a diffraction effect caused when the electromagnetic wave passes through an opening provided between cut-off portions for cutting of the electromagnetic wave.