Semiconductor device and manufacturing method thereof
View Patent ↗Provided are a semiconductor device making it possible to form an element region having a dimension close to a designed dimension, restrain a phenomenon similar to gate-induced drain leakage, and further restrain compressive stress to be applied to the element region by oxidation of a conductive film; and a method for manufacturing the semiconductor device. Trenches are made in a main surface of a semiconductor substrate. By oxidizing the wall surface of each of the trenches, a first oxide film is formed on the wall surface. An embedded conductive film is formed to be embedded into the trench. The embedded conductive film is oxidized in an atmosphere containing an active oxidizing species, thereby forming a second oxide film. A third oxide film is formed on the second oxide film by CVD or coating method.
1. A manufacturing method of a semiconductor device, comprising:
making a trench in a main surface of a semiconductor substrate;
oxidizing a wall surface of the trench in an atmosphere containing an active oxidizing species, thereby forming a first oxide film on the wall surface;
forming an embedded conductive film so as to be embedded into the trench, the wall surface of which being covered with the first oxide film;
oxidizing the embedded conductive film in an atmosphere containing an active oxidizing species, thereby forming a second oxide film; and
forming a third oxide film having tensile stress over the second oxide film, the third oxide film formed only right over the embedded conductive film,
wherein in the oxidizing the embedded conductive film, a tapered region, having a width which is made smaller in a direction extending from where the first oxide film is jointed to the second oxide film at an upper portion of the embedded conductive film towards a lower portion of the embedded conductive film, is formed in the first oxide film, and
wherein in the forming the embedded conductive film, an upper surface of the embedded conductive film is lower than the main surface of the semiconductor substrate.
2. The manufacturing method of a semiconductor device according to claim 1 , wherein the third oxide film is formed by one of sub-atmospheric chemical vapor deposition and coating method.
3. The method of manufacturing the semiconductor device according to claim 1 , wherein the third oxide film is in contact with the second oxide film.
4. A manufacturing method of a semiconductor device, comprising the steps of:
making a trench in a main surface of a semiconductor substrate;
oxidizing a wall surface of the trench in an atmosphere containing an active oxidizing species, thereby forming a first oxide film on the wall surface;
forming an embedded conductive film so as to be embedded into the trench, the wall surface of which being covered with the first oxide film;
oxidizing the embedded conductive film in an atmosphere containing an active oxidizing species, thereby forming a second oxide film; and
forming a third oxide film having tensile stress over the second oxide film, the third oxide film formed only right over the embedded conductive film.
5. The manufacturing method of the semiconductor device according to claim 4 ,
wherein, in the making the trench, the trench is made by etching the semiconductor substrate and a nitride film formed over the semiconductor substrate.
6. The manufacturing method of the semiconductor device according to claim 4 ,
wherein, in the oxidizing the wall surface of the trench, the wall surface of the trench in the nitride film is oxidized.