Spread reflector for a lamp structure
View Patent ↗A spread primary reflector for a UV curing lamp employs a substrate that has been faceted. The facets may be produced by means of stamping, etching, or a combination of chemical-mechanical processes. The faceting randomizes the focusing effects of the primary reflector's elliptical curvature while maintaining a total directed energy output and hence a uniform irradiance of a work product. The reflector may be made of a stand-alone reflective material with a preformed faceting pattern, such as from a metal substrate and coated with an optical coating to tailor the reflective properties of the surface of the substrate.
1. A reflector for reflecting radiation produced by a source of radiation for curing applications, comprising a substrate having a half-elliptical cross-section, the substrate comprising an inner surface, the inner surface being substantially reflective and populated with a plurality of facets, the facets having a randomly-oriented pattern with respect to size, shape, location and orientation and configured to randomize and diffuse focusing effects of an elliptical curvature of the reflector, the reflector being sized and shaped to reflect light from the source of radiation placed proximal to an internal focus of the half elliptical cross-section over a volume proximal to an external focus of the half elliptical cross-section.
2. The reflector of claim 1 , wherein the substrate is further sized and shaped such that a work product placed proximal to the external focus receives a total energy that is substantially the same as that produced by a reflector having substantially the same half-elliptical cross-section with a smooth inner surface.
3. The reflector of claim 1 , further comprising a reflective material coating on the inner surface, the facets being formed in the coating.
4. The reflector of claim 3 , wherein the substrate further comprises a back surface, wherein the back surface is smooth.
5. The reflector of claim 1 , wherein the reflective material coating is at least one layer of a dielectric material that forms constructive interference filters.
6. The reflector of claim 1 , wherein the reflective material coating comprises a polytetraflouroethylene (PTFE) material.
7. The reflector of claim 1 , wherein the facets are formed in the entire substrate.
8. The reflector of claim 1 , wherein the substrate is made of metal.
9. The reflector of claim 8 , wherein the metal is one of aluminum and stainless steel.
10. The reflector of claim 1 , wherein the substrate is made of a dielectric material.
11. The reflector of claim 10 , wherein the dielectric material is one of quartz and infrared absorbing glasses.
12. The reflector of claim 1 , wherein the facets are produced by at least one of a stamping, an embossing, an etching, a deposition, a photographic, and a lithographic process.
13. The reflector of claim 1 , wherein the facets have a size and pattern that are varied along at least one of a length of the half-elliptical cross-section and along a cross-section corresponding to a length of the source of radiation.
14. The reflector of claim 12 , wherein facet size increases with increasing distance from a center portion of the half-elliptical cross-section.
15. A method for manufacturing a reflector for reflecting radiation produced by a source of radiation for curing applications, comprising the steps of:
providing a substrate;
forming the substrate to have a half-elliptical cross-section, the substrate comprising an inner surface, the inner surface being substantially reflective; and
populating at least the inner surface of the substrate with a plurality of facets, wherein the facets have a randomly-oriented pattern with respect to size, shape, location and orientation and configured to randomize and diffuse focusing effects of an elliptical curvature of the reflector and
wherein the reflector is sized and shaped to reflect light from the source of radiation placed proximal to an internal focus of the half elliptical cross-section over a volume proximal to an external focus of the half elliptical cross-section.
16. The method of claim 15 , further comprising the step of sizing and shaping the substrate such that a work product placed proximal to the second focus receives a total energy that is substantially the same as that produced by a reflector having substantially the same half-elliptical cross-section with a smooth inner surface.
17. The method of claim 15 , further comprising the steps of:
coating the inner surface with a reflective material and
forming the facets in the coated inner surface.
18. The method of claim 15 , wherein the step of populating at least the inner surface of the substrate comprises forming the facets in the entire substrate.
19. The method of claim 15 , wherein the facets are produced by at least one of a stamping, an embossing, an etching, a deposition, a photographic, and a lithographic process.
20. The method of claim 15 , further comprising the step of varying a size and pattern of the facets along at least one of a length of the half-elliptical cross-section and along a cross-section corresponding to a length of the source of radiation.
21. The method of claim 20 , wherein facet size increases with increasing distance from a center portion of the half-elliptical cross-section.