Method of fabricating a device with flexible substrate and method for stripping flexible-substrate
A method for fabricating a device with a flexible substrate includes providing a rigid substrate at first. Next, an interfacing layer can be formed on the rigid substrate, and then a flexible substrate is directly formed on the interfacing layer. The flexible substrate fully contacts the interfacing layer. A device structure is then formed on the flexible substrate.
1. A method for fabricating a device with a flexible substrate, the method comprising:
providing a rigid substrate;
forming an interfacing layer on the rigid substrate;
directly forming the flexible substrate on the interfacing layer, wherein the flexible substrate fully contacts the interfacing layer;
forming a device structure on the flexible substrate; and
stripping the flexible substrate with the device structure from the rigid substrate, wherein the interfacing layer remains on the rigid substrate.
2. The method of claim 1 , wherein the step of stripping the flexible substrate from the rigid substrate comprises:
directly stripping the flexible substrate from the interfacing layer, wherein a material of the flexible substrate is polymer, allowing stripping the flexible substrate from the interface layer.
3. The method of claim 2 , wherein a material of the flexible substrate is poly(dimethylsiloxane) (PMDS), PI, PES, PEN, PET, PC, and these derivatives.
4. The method of claim 3 , wherein the device structure comprises an organic semiconductor device structure or an inorganic semiconductor device structure.
5. The method of claim 3 , wherein the device structure comprises an organic thin film transistor.
6. The method of claim 3 , wherein the flexible substrate is formed on the rigid substrate by performing a coating process.
7. The method of claim 3 , wherein the step of forming the device structure further comprises forming a protection layer between the device structure and the flexible substrate.