Materials, fabrication equipment, and methods for stable, sensitive photodetectors and image sensors made therefrom
Optically sensitive devices include a device comprising a first contact and a second contact, each having a work function, and an optically sensitive material between the first contact and the second contact. The optically sensitive material comprises a p-type semiconductor, and the optically sensitive material has a work function. Circuitry applies a bias voltage between the first contact and the second contact. The optically sensitive material has an electron lifetime that is greater than the electron transit time from the first contact to the second contact when the bias is applied between the first contact and the second contact. The first contact provides injection of electrons and blocking the extraction of holes. The interface between the first contact and the optically sensitive material provides a surface recombination velocity less than 1 cm/s.
1. An optically sensitive device comprising:
a first contact and a second contact, each having a work function;
an optically sensitive material between the first contact and the second contact, the optically sensitive material comprising a p-type semiconductor, and the optically sensitive material having a work function;
circuitry configured to apply a bias voltage between the first contact and the second contact;
the magnitude of the work function of the optically sensitive material being at least 0.4 eV greater than the magnitude of the work function of the first contact, and also at least 0.4 eV greater than the magnitude of the work function of the second contact;
the optically sensitive material having an electron lifetime that is greater than the electron transit time from the first contact to the second contact when the bias is applied between the first contact and the second contact;
the first contact providing injection of electrons and blocking the extraction of holes; and
the interface between the first contact and the optically sensitive material providing a surface recombination velocity less than 1 cm/s.
2. The device of claim 1 , wherein the work function of the first contact and the second contact are each shallower than 4.5 ev.
3. The device of claim 1 , wherein the bias is in the range of about −0.1 Volts to −2.8 Volts.
4. The device of claim 1 , wherein the optically sensitive material comprises a plurality of nanoparticles, wherein each of the nanoparticles has an oxide on a surface of the respective nanoparticle.
5. The device of claim 1 , wherein the optically sensitive material comprises nanoparticles selected from the group consisting of PbS, PbSe, PbTe, CdS, CdSe, CdTe, Si, Ge, or C.
6. The device of claim 5 , wherein the optically sensitive layer further comprises a material selected from the group consisting of PbSO4, PbO, PbSeO4, PbTeO4, SiOxNy, In2O3, sulfur, sulfates, sulfoxides, carbon and carbonates.
7. The device of claim 1 , wherein the optically sensitive material comprises a plurality of interconnected nanoparticles.
8. The device of claim 1 , wherein the first contact and the second contact each comprise a material selected from the group consisting of Al, Ag, In, Mg, Ca, Li, Cu, Ni, NiS, TiN, TaN, TiO2, TixNy, ITO, Ru, TiSi, WSi2, TiOx doped with B, TiOx doped with C, TiOx doped with Co, TiOx doped with Fe, TiOx doped with Nd, TiOx doped with N.
9. The device of claim 1 , wherein the first contact and the second contact are separated by a distance in the range of 200 nm to 2 um and the electron mobility in the optically sensitive material is at least 1 E-5 cm2/Vs.
10. The device of claim 1 , wherein the optically sensitive material is configured to provide a responsivity of at least 0.8 A/W when the bias is applied between the first contact and the second contact.
11. A photodetector comprising:
a first contact and a second contact, each having a work function;
an optically sensitive material between the first contact and the second contact, the optically sensitive material comprising a p-type semiconductor, and the optically sensitive material having a work function;
circuitry configured to apply a bias voltage between the first contact and the second contact;
the magnitude of the work function of the optically sensitive material being at least 0.4 eV greater than the magnitude of the work function of the first contact, and also at least 0.4 eV greater than the magnitude of the work function of the second contact;
circuitry configured to apply a bias voltage between the first contact and the second contact; and
the optically sensitive material configured to provide a responsivity of at least 0.8 A/W when the bias is applied between the first contact and the second contact.
12. The device of claim 11 , wherein the work function of the first contact and the second contact are each shallower than 4.5 eV.
13. The device of claim 11 , wherein the bias is in the range of about −0.1 Volts to −2.8 Volts.
14. The device of claim 11 , wherein the optically sensitive material comprises nanoparticles selected from the group consisting of PbS, PbSe, PbTe, CdS, CdSe, CdTe, Si, Ge, or C.
15. The device of claim 14 , wherein the optically sensitive layer further comprises a material selected from the group consisting of PbSO4, PbO, PbSeO4, PbTeO4, SiOxNy, In2O3, sulfur, sulfates, sulfoxides, carbon and carbonates.
16. The device of claim 11 , wherein the first contact and the second contact each comprise a material selected from the group consisting of Al, Ag, In, Mg, Ca, Li, Cu, Ni, NiS, TiN, TaN, TiO2, TixNy, ITO, Ru, TiSi, WSi2, TiOx doped with B, TiOx doped with C, TiOx doped with Co, TiOx doped with Fe, TiOx doped with Nd, TiOx doped with N.
17. The device of claim 11 , wherein the first contact and the second contact are separated by a distance in the range of 200 nm to 2 um and the electron mobility in the optically sensitive material is at least 1 E-5 cm2/Vs.