Method and apparatus for the measurement of atmospheric leaks in the presence of chamber outgassing
Embodiments of the present invention employ measurement of argon as the means to detect the presence of an atmospheric leak in a processing chamber. Argon detected inside the process chamber is conclusive evidence of a leak. Furthermore, the amount of detected argon provides information on the rate of air entering through the leak. In one embodiment, leak detection takes place in the main plasma inside the processing chamber. In another embodiment, leak detection takes place in the self-contained plasma generated in a remote plasma sensor. Additional measurements can be performed, such as measuring the amount of oxygen, and/or the presence of moisture to help in detecting and quantifying outgassing from the processing chamber.
1. A method of determining the presence of an atmospheric leak in a process chamber, comprising:
sealing the chamber;
injecting gas consisting essentially of nitrogen into the chamber;
igniting plasma in the chamber using the nitrogen;
detecting changes in the amount of argon inside the chamber;
declaring a presence of a leak when the amount of argon increases over time.
2. The method of claim 1 wherein detecting changes is carried out with optical emission spectroscopy.
3. The method of claim 1 wherein detecting changes is carried out with infrared adsorption.
4. The method of claim 1 wherein detecting changes is carried out with residual gas analysis.
5. A method of determining the presence of an atmospheric leak in a process chamber, comprising:
sealing the chamber;
detecting changes in the amount of argon inside the chamber;
declaring a presence of a leak when the amount of argon increases over time; and,
wherein detecting changes is performed on plasma located in a remote, self-contained region relative to the chamber and sustained by gas consisting essentially of nitrogen.
6. The method of claim 5 further comprising concurrently detecting outgassing within the chamber by detecting the presence of oxygen in the chamber.
7. The method of claim 6 , wherein detecting oxygen is used to calculate the amount of outgassing from the chamber walls.
8. The method of claim 5 further comprising concurrently detecting outgassing within the chamber by detecting the presence of moisture in the chamber.
9. The method of claim 8 , wherein detecting moisture is used to calculate the amount of outgassing from the chamber walls.
10. The method of claim 5 , wherein detecting changes is carried out with optical emission spectroscopy.
11. A method of determining the presence of an atmospheric leak in a process chamber, comprising:
sealing the chamber;
evacuating the chamber to a prescribed vacuum level;
injecting gas consisting essentially on nitrogen into the chamber;
igniting plasma in the chamber using the nitrogen;
detecting changes in the amount of argon inside the chamber; and,
declaring a presence of a leak when the amount of argon increases over time.
12. The method of claim 11 where the measurement is carried out with optical emission spectroscopy.
13. The method of claim 11 where the measurement is carried out with infrared adsorption.
14. The method of claim 11 where the measurement is carried out with residual gas analysis.
15. A method of determining the presence of an atmospheric leak in a process chamber, comprising:
sealing the chamber;
evacuating the chamber to a prescribed vacuum level;
detecting changes in the amount of argon inside the chamber using emission; and,
wherein the emission is created by a remote, self-contained plasma sustained by gas consisting essentially of nitrogen; and,
declaring a presence of a leak when the amount of argon increases over time.
16. The method of claim 15 further comprising concurrently detecting outgassing within the chamber by measuring amount of oxygen in the chamber.
17. The method of claim 16 , where the measurement of oxygen is used to calculate the amount of outgassing from the chamber walls.
18. The method of claim 15 further comprising concurrently detecting outgassing within the chamber by measuring for the presence of moisture in the chamber.
19. The method of claim 18 , where the measurement of moisture is used to calculate the amount of outgassing from the chamber walls.
20. The method of claim 15 , where the measurement is carried out with residual gas analysis.