Method of manufacturing organic light emitting device
View Patent ↗A method of manufacturing an organic light emitting device by which a pixel defining layer can be easily formed. The method includes: forming a first electrode on a substrate; forming a photoresist layer to cover the first electrode; patterning the photoresist layer and forming a blocking layer so that the blocking layer is on a side of the first electrode opposite to a side facing the substrate; forming a pixel defining layer on the substrate to cover side ends of the first electrode; removing the blocking layer and exposing the side of the first electrode contacting the blocking layer; forming an intermediate layer including an organic light emitting layer on the side of the first electrode that is exposed by removing the blocking layer; and forming a second electrode on the intermediate layer.
1. A method of manufacturing an organic light emitting device, the method comprising:
forming a first electrode on a substrate;
forming a photoresist layer to cover the first electrode;
patterning the photoresist layer and forming a blocking layer on and contacting a first side of the first electrode opposite to a second side of the first electrode that faces the substrate;
forming a pixel defining layer on the substrate to cover side ends of the first electrode, wherein after forming the pixel defining layer, at least a portion of a side of the blocking layer extending from the first side of the first electrode is exposed, and a thickness of a thickest portion of the pixel defining layer is less than a total thickness of the first electrode and the blocking layer;
removing the blocking layer and exposing the first side of the first electrode while the side ends of the first electrode remain covered by the pixel defining layer;
forming an intermediate layer comprising an organic light emitting layer on the first side of the first electrode that is exposed by removing the blocking layer; and
forming a second electrode on the intermediate layer.
2. The method of claim 1 , wherein a width of a first side of the blocking layer contacting the first side of the first electrode is smaller than a width of the first side of the first electrode.
3. The method of claim 1 , wherein the pixel defining layer comprises an inorganic material.
4. The method of claim 1 , wherein the pixel defining layer comprises a material selected from the group consisting of SiO 2 , SiN x , SiON, and Al 2 O 3 .
5. The method of claim 1 , wherein the pixel defining layer has an opening tapering toward the first electrode.
6. A method of manufacturing an organic light emitting device, the method comprising:
forming a first electrode on a substrate;
forming a photoresist layer to cover the first electrode;
patterning the photoresist layer and forming a blocking layer on and contacting a first side of the first electrode opposite to a second side of the first electrode that faces the substrate;
forming a pixel defining layer on the substrate to cover side ends of the first electrode;
removing the blocking layer and exposing the first side of the first electrode while the side ends of the first electrode remain covered by the pixel defining layer;
forming an intermediate layer comprising an organic light emitting layer on the first side of the first electrode that is exposed by removing the blocking layer; and
forming a second electrode on the intermediate layer,
wherein a width of a second side of the blocking layer opposite to a first side contacting the first side of the first electrode is larger than that of the first side of the blocking layer.
7. The method of claim 6 , wherein a width of the blocking layer gradually increases from the first side contacting the first side of the first electrode toward the second side of the blocking layer.
8. A method of manufacturing an organic light emitting device, the method comprising:
forming a first electrode on a substrate;
forming a blocking layer on and contacting a first side of the first electrode opposite to a second side thereof facing the substrate;
forming a pixel defining layer on the substrate to cover side portions of the first electrode, wherein after forming the pixel defining layer, at least a portion of a side of the blocking layer extending from the first side of the first electrode is exposed, and a thickness of a thickest portion of the pixel defining layer is less than a total thickness of the first electrode and the blocking layer;
removing the blocking layer and exposing the first side of the first electrode while the side portions of the first electrode remain covered by the pixel defining layer;
forming an intermediate layer comprising an organic light emitting layer on the first side of the first electrode that is exposed by removing the blocking layer; and
forming a second electrode on the intermediate layer.
9. The method of claim 8 , further comprising:
forming a photoresist layer to cover the first electrode; and
patterning the photoresist layer to form the blocking layer.
10. The method of claim 8 , wherein the blocking layer has a tapered shape.
11. The method of claim 8 , wherein the pixel defining layer has a tapered shape opening exposing the first side of the first electrode.