Method of manufacturing a flexible device and method of manufacturing a flexible display
View Patent ↗Provided are a method of separating a metal layer and an organic light emitting diode. A method of manufacturing a flexible device and a method of manufacturing a flexible display include forming a releasing layer on a substrate, forming a metal layer on the releasing layer, forming an insulating layer on the metal layer, forming a releasable layer on the insulating layer, bonding a plastic to the releasable layer, and separating the substrate and the releasing layer at an interface therebetween to manufacture a flexible device. Since the conventional process equipment using the glass substrate can be compatibly used, the manufacturing cost can be reduced. In addition, since the glass substrate has less limitation in the process temperature compared with the plastic substrate, an electric device having a superior performance can be manufactured. Furthermore, the glass substrate has good thermal/chemical stability and is less deformed compared with the plastic substrate, whereby process control such as substrate alignment becomes easy.
1. A method of manufacturing a flexible device, the method comprising:
forming a releasing layer on a mother substrate;
forming a releasing layer pattern by patterning the releasing layer;
forming a metal layer on the releasing layer pattern;
forming an insulating layer on the metal layer;
forming a semiconductor device layer on the insulating layer;
bonding a flexible substrate to the semiconductor device layer; and
separating the mother substrate and the releasing layer pattern at an interface therebetween to remove the mother substrate.
2. The method of claim 1 , wherein the releasing layer is formed of one of MgO, MnO, Mn3O4, MoOy, SnO2, SeOx, SiOx, GaOx, InO, TixOy, VxOy, ZrOy, WOy, Al2O3, SrO, TexOy, TeO2, ZnO, ITO, IZO, SiN, TiN, TaN, AN, BN, MO2N, VN, ZrN, NbN, CrN, Ga and combinations thereof.
3. The method of claim 1 , wherein the releasing layer is formed to have a thickness of approximately 1 nm or more.
4. The method of claim 1 , wherein the metal layer is formed of one of Ag, Au, Cu, Cr, W, Al, Mo, Zn, Ni, Pt, Pd, Co, In, Mn, Si, Ta, Ti, Sn, Zn, Pb, V, Ru, Ir, Zr, Rh and combinations thereof.
5. The method of claim 4 , wherein the metal layer is formed to have a thickness of approximately 1 nm or more.
6. The method of claim 1 , wherein the insulating layer is formed of an insulator comprising one of silicon oxide (SiO2), silicon nitride (SiNx), photoresist, polyimide and combinations thereof.
7. The method of claim 1 , wherein the semiconductor device layer comprises at least one of an organic light emitting diode and an organic field effect transistor.
8. The method of claim 1 , wherein a glass substrate is used as the mother substrate.
9. The method of claim 1 , wherein a plastic substrate is used as the flexible substrate.
10. A method of manufacturing a flexible display where a light emitting device of a semiconductor device layer functions as a unit pixel, the method comprising:
forming a releasing layer on a mother substrate;
forming a releasing layer pattern by patterning the releasing layer;
forming a metal layer on the releasing layer pattern;
forming an insulating layer on the metal layer;
forming a semiconductor device layer comprising a light emitting device on the insulating layer;
bonding a flexible substrate to the semiconductor device layer; and
separating the mother substrate and the releasing layer pattern at an interface therebetween to remove the mother substrate.
11. The method of claim 10 , wherein the releasing layer is formed of one of MgO, MnO, Mn3O4, MoOy, SnO2, SeOx, SiOx, GaOx, InO, TixOy, VxOy, ZrOy, WOy, Al2O3, SrO, TexOy, TeO2, ZnO, ITO, IZO, SiN, TiN, TaN, AN, BN, MO2N, VN, ZrN, NbN, CrN, Ga and combinations thereof.
12. The method of claim 10 , wherein the metal layer is formed of one of Ag, Au, Cu, Cr, W, Al, Mo, Zn, Ni, Pt, Pd, Co, In, Mn, Si, Ta, Ti, Sn, Zn, Pb, V, Ru, Ir, Zr, Rh and combinations thereof.
13. The method of claim 10 , wherein the insulating layer is formed of an insulator comprising one of silicon oxide (SiO2), silicon nitride (SiNx), photoresist, polyimide and combinations thereof.
14. The method of claim 10 , wherein the semiconductor device layer comprises at least one of an organic light emitting diode and an organic field transistor.
15. The method of claim 10 , wherein a glass substrate is used as the mother substrate.
16. The method of claim 10 , wherein a plastic substrate is used as the flexible substrate.