Method for removing phosphorous and boron from aluminium silicon alloy for use in purifying silicon
View Patent ↗Embodiments of the present invention relate to a process for purifying silicon by removing one or both of phosphorus and boron.
1. A process for removing phosphorous and boron from metallurgical grade silicon, the method comprising:
a) heating a mixture of aluminum, metallurgical grade silicon, and at least one of calcium, titanium, vanadium, zirconium, chromium, hafnium, silicon dioxide, and sodium chloride, with greater than the eutectic composition of silicon, to form a melt, wherein the metallurgical grade silicon comprises about 14-135 ppmwt phosphorus and about 4-50 ppmwt boron;
b) cooling the melt to a temperature above the solidus temperature;
c) contacting the melt with a gas comprising oxygen, present in about 15 wt. % to about 75 wt. % of the gas, such that a vortex is formed in the melt, wherein the vortex is at least at the surface of the melt, wherein the gas is injected using a rotary impeller, wherein the oxygen contacts the melt, without chlorine, and,
d) removing dross present in the melt;
wherein the process removes boron and phosphorus from silicon, wherein the phosphorus is reduced to about 0.1-20 ppmwt, and the boron is reduced to about 0.1-10 ppmwt,
wherein the process optionally further removes at least one of calcium, lithium, magnesium, strontium, aluminum, and titanium contained in the metallurgical grade silicon,
wherein the silicon that is obtained from the process is used in the manufacture of solar cells.
2. The process of claim 1 , wherein the melt is cooled to a temperature between the solidus and liquidus temperature.
3. The process of claim 1 , wherein removing the dross comprises heating the melt above the liquidus temperature.
4. The process of claim 1 , wherein contacting the cooled melt with a gas comprises injecting.
5. The process of claim 1 , wherein metallurgical silicon and 1000 series aluminum are used, wherein the mixture comprises about 25-70 wt. % silicon, or a combination thereof.
6. The process of claim 1 , wherein the phosphorous is reduced to about 2-15 ppmwt, wherein the boron is reduced to about 0.1-10 ppmwt, or a combination thereof.
7. The process of claim 1 , further comprising contacting the melt with one or more salts to lower the impurity levels.
8. The process of claim 4 , wherein the gas mixture is injected between the solidus and liquidus temperature of the melt.
9. The process of claim 1 , wherein the rotary impeller is manufactured from graphite, silicon carbide, silicon carbide-alumina, alumina, fused silica, quartz or silicon nitride (Si 3 N 4 ) material.
10. The process of claim 1 , further comprising after removing the dross present in the melt, contacting the melt with argon or nitrogen.
11. The process of claim 1 , further comprising removing aluminum from the aluminum-silicon mixture.
12. The process of claim 1 , wherein the process is carried out using about 1000 lbs (453.592 kg) to about 40,000 lbs (18143.694 kg) of mixture.
13. A process for removing phosphorous and boron from silicon, the method comprising:
a) heating, a mixture of aluminum, metallurgical grade silicon, and at least one of calcium, titanium, vanadium, zirconium, chromium, hafnium, silicon dioxide, and sodium chloride, with greater than the eutectic composition of silicon, to form a melt, wherein the metallurgical grade silicon comprises about 14-135 ppmwt phosphorus and about 4-50 ppmwt boron;
b) cooling the melt to a temperature above the solidus temperature and below the liquidus temperature;
c) contacting the cooled melt with a gas comprising oxygen, such that a vortex is formed in the melt, wherein the vortex is at least at the surface of the melt, wherein the gas is injected using a rotary impeller, wherein the oxygen is present in about 15 wt. % to about 75 wt. % of the gas, and wherein the oxygen contacts the melt, without chlorine;
d) heating the dross above the liquidus temperature of the melt;
e) removing dross present in the melt;
wherein the process removes boron and phosphorus from silicon, wherein the phosphorus is reduced to about 0.1-20 ppmwt, and the boron is reduced to about 0.1-10 ppmwt,
wherein the process optionally further removes at least one of calcium, lithium, magnesium, strontium, aluminum, and titanium contained in the silicon.
14. The process of claim 1 , wherein the remaining gas or gases is an inert gas or gases.
15. The process of claim 1 , after the contacting the melt with the gas comprising oxygen, further comprising contacting the melt with hydrogen, one or more inert gases, or a combination thereof.
16. The process of claim 1 , after the contacting the melt with the gas comprising oxygen, further comprising contacting the melt with hydrogen or hydrochloric acid gas, hydrochloric acid and/or water vapor, or a combination of these gases.
17. The process of claim 1 , wherein phosphorus is reduced to below about 5 ppmwt.
18. The process of claim 1 , wherein boron is reduced to about 1-3.5 ppmwt.
19. The process of claim 1 , wherein the strontium and calcium is reduced to about 0.1-5 ppmwt.
20. The process of claim 1 , wherein the magnesium is reduced to below about 10 ppmwt.
21. The process of claim 1 , which is repeated one or more times.
22. The process of claim 1 , wherein the gas is introduced into the molten liquid, creating bubbles about 1-10 mm in diameter, on average.
23. The process of claim 1 , wherein after the contacting the melt with the gas comprising oxygen, further comprising contacting the melt with argon or nitrogen for about 15 minutes or more.