Silicon dioxide dispersion
View Patent ↗Stable, aqueous dispersion containing silicon dioxide powder having a hydroxyl group density of 2.5 to 4.7 OH/nm 2 , which is obtained from a silicon dioxide powder produced by a flame hydrolysis process under acid conditions. The dispersion is produced by incorporating the silicon dioxide powder into an aqueous solution by means of a dispersing device. The dispersion can be used to produce glass articles.
1. An aqueous dispersion comprising a silicon dioxide powder dispersed in water, wherein the silicon dioxide powder is produced by flame hydrolysis and displays a hydroxyl group density of 2.5 to 4.7 OH/nm 2 , wherein the hydroxyl group density is determined by reaction of the silicon dioxide powder with lithium aluminium hydride according to the method of J. Mathias and G. Wannemacher in the Journal of Colloid and Interface Science 125 (1988).
2. The aqueous dispersion according to claim 1 , wherein the dispersion, over a period of 6 months, does not thicken further and forms no sediment.
3. The aqueous dispersion according to claim 1 , wherein the dispersion has a content of silicon dioxide powder between 10 and 70 wt. %.
4. The aqueous dispersion according to claim 1 , wherein the dispersion has a pH between 3 and 12.
5. The aqueous dispersion according to claim 1 , wherein the average aggregate diameter in the dispersion is less than 200 nm.
6. The aqueous dispersion according to claim 1 , wherein the dispersion contains oxidising agents, corrosion inhibitors and/or surface-active substances.
7. A method of making an aqueous dispersion the method comprising
incorporating a silicon dioxide powder into an aqueous solution by means of a dispersing device; and
producing the dispersion of claim 1 .
8. A method of using an aqueous dispersion, the method comprising applying the dispersion of claim 1 to a substrate.
9. The aqueous dispersion of claim 4 , wherein the pH of the aqueous dispersion is from 3 to 6.
10. The aqueous dispersion of claim 4 , wherein the pH of the aqueous dispersion is from 4 to 5.
11. The aqueous dispersion of claim 4 , wherein the pH of the aqueous dispersion is from 8.5 to 12.
12. The aqueous dispersion of claim 4 , wherein the pH of the aqueous dispersion is from 9 to 10.5.
13. The aqueous dispersion of claim 3 , wherein the aqueous dispersion has a content of silicon dioxide powder of from 20 to 60 wt. %.
14. The aqueous dispersion of claim 3 , wherein the aqueous dispersion has a content of silicon dioxide powder of from 30 to 50 wt. %.
15. The aqueous dispersion of claim 1 , further comprising a corrosion inhibitor.
16. The aqueous dispersion of claim 15 , wherein the corrosion inhibitor is comprised in the aqueous dispersion in an amount of from 0.001 to 2 wt. %.
17. The aqueous dispersion of claim 15 , wherein the corrosion inhibitor is selected from the group consisting of a benzotriazole, a substituted benzimidazole, a substituted pyrazine, a substituted pyrazole, and combinations thereof.
18. The aqueous dispersion of claim 1 , further comprising an oxidising agent.
19. The aqueous dispersion of claim 18 , wherein the oxidising agent is comprised in the aqueous dispersion in an amount of from 0.3 and 20 wt. %.
20. The aqueous dispersion of claim 18 , wherein the oxidising agent is selected from the group consisting of hydrogen peroxide, a hydrogen peroxide adduct, an organic per acid, and combinations thereof.