IP Library Patent Application 12541945
Patent Application
App. No. 12/541,945

Selective Emitter Solar Cell and Fabrication Method Thereof

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Patent No.
US None
App. No.
12/541,945
Abstract

A fabrication method of a selective emitter solar cell, including: forming a selective emitter solar cell base having a buried grid electrode; forming an anti-reflection layer on the emitter surface of the solar cell base; forming a bus-bar on the anti-reflection layer; and connecting the buried grid electrode with the bus-bar in the traversing direction underneath through the anti-reflection layer. Accordingly, the invention provides a selective emitter solar cell. With the method of the invention, emitters and bus-bars are made separately, the width of the emitters can be reduced according to actual needs, the area that is unnecessarily taken may be reduced, the effective area for a solar cell panel to receive sunlight may be increased. The invention improves conversion efficiency of a selective emitter solar cell panel from 16.5% to 18% or more.

Claims (43)

1 . A method for fabricating a selective emitter solar cell, comprising:

forming a selective emitter solar cell base having a buried grid electrode;

forming an anti-reflection layer on the emitter surface of the solar cell base;

forming a bus-bar on the anti-reflection layer; and

connecting the bus-bar with the buried grid electrode in the traversing direction underneath through the anti-reflection layer.

2 . The method for fabricating a selective emitter solar cell according to claim 1 , wherein the forming of a selective emitter solar cell base having a buried grid electrode comprises:

forming an emitter groove in a semiconductor substrate;

forming an emitter P-N junction near the emitter groove in the semiconductor substrate; and

forming a barrier layer, a conducting layer and a bond layer sequentially in the emitter groove, which form the buried grid electrode.

3 . The method for fabricating a selective emitter solar cell according to claim 2 , wherein the emitter groove has a width of 10-50 μm and a depth of 10-50 μm.

4 . The method for fabricating a selective emitter solar cell according to claim 1 , wherein the bus-bar has a width of 3000-5000 μm.

5 . The method for fabricating a selective emitter solar cell according to claim 2 , wherein the semiconductor substrate surface has a sheet resistance larger than 100 Ω/□.

6 . The method for fabricating a selective emitter solar cell according to claim 2 , wherein the emitter groove surface has a sheet resistance less than 30 Ω/□.

7 . The method for fabricating a selective emitter solar cell according to claim 2 , wherein the material of the barrier layer is nickel, the material of the conducting layer is copper, and the material of the bond layer is silver.

8 . The method for fabricating a selective emitter solar cell according to claim 2 , wherein the barrier layer has a thickness of 2˜20 μm, the conducting layer has a thickness of 5˜50 μm, the bond layer has a thickness of 5˜50 μm.

9 . The method for fabricating a selective emitter solar cell according to claim 1 , wherein the material of the bus-bar is silver.

10 . The method for fabricating a selective emitter solar cell according to claim 1 , wherein the bus-bar and the buried grid electrode are arranged perpendicularly to each other.

11 . The method for fabricating a selective emitter solar cell according to claim 10 , wherein the buried grid electrodes are arranged in parallel to each other with the same distance therebetween.

12 . The method for fabricating a selective emitter solar cell according to claim 10 , wherein the bus-bars are arranged in parallel to each other with the same distance therebetween.

13 . The method for fabricating a selective emitter solar cell according to claim 2 , wherein the forming of the selective emitter solar cell base comprises forming a sub-buried grid electrode.

14 . The method for fabricating a selective emitter solar cell according to claim 13 , wherein the sub-buried grid electrode and the buried grid electrode intersect perpendicularly in the same plane, and the sub-buried grid electrode lies right underneath the bus-bar and in parallel to the bus-bar.

15 . The method for fabricating a selective emitter solar cell according to claim 13 , wherein the solar cell base is co-fired so that the bus-bar is connected with the buried grid electrode in the traversing direction underneath through the anti-reflection layer.

16 . A selective emitter solar cell, comprising:

a selective emitter solar cell base having a buried grid electrode;

an anti-reflection layer formed on the emitter surface of the solar cell base; and

a bus-bar formed on the anti-reflection layer, which is connected with the buried grid electrode in the traversing direction underneath through the anti-reflection layer.

17 . The selective emitter solar cell according to claim 16 , wherein the selective emitter solar cell base having a buried grid electrode comprises:

a semiconductor substrate;

an emitter groove formed in the semiconductor substrate;

an emitter P-N junction formed near the emitter groove in the semiconductor substrate; and

a barrier layer, a conducting layer and a bond layer formed sequentially in the emitter groove.

18 . The selective emitter solar cell according to claim 17 , wherein the emitter groove has a width of 10˜50 μm and a depth of 10˜50 μm.

19 . The selective emitter solar cell according to claim 16 , wherein the bus-bar has a width of 3000˜5000 μm.

20 . The selective emitter solar cell according to claim 17 , wherein the semiconductor substrate surface has a sheet resistance larger than 100 Ω/□.

21 . The selective emitter solar cell according to claim 17 , wherein the emitter groove surface has a sheet resistance less than 30 Ω/□.

22 . The selective emitter solar cell according to claim 17 , wherein the material of the barrier layer is nickel, the material of the conducting layer is copper, and the material of the bond layer is silver.

23 . The selective emitter solar cell according to claim 17 , wherein the barrier layer has a thickness of 2˜20 μm, the conducting layer has a thickness of 5˜50 μm, the bond layer has a thickness of 5˜50 μm.

24 . The selective emitter solar cell according to claim 16 , wherein the material of the bus-bar is silver.

25 . The selective emitter solar cell according to claim 16 , wherein the bus-bar and the buried grid electrode are arranged perpendicularly to each other.

26 . The selective emitter solar cell according to claim 25 , wherein the buried grid electrodes are arranged in parallel to each other with the same distance therebetween.

27 . The selective emitter solar cell according to claim 25 , wherein the bus-bars are arranged in parallel to each other with the same distance therebetween.

28 . The selective emitter solar cell according to claim 17 , wherein a sub-buried grid electrode is formed in forming of the selective emitter solar cell base.

29 . The selective emitter solar cell according to claim 28 , wherein the sub-buried grid electrode and the buried grid electrode intersect perpendicularly in the same plane, and the sub-buried grid electrode lies right underneath the bus-bar and in parallel to the bus-bar.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 19, 2012
From: SEMICONDUCTOR MANUFACTURING INTERNATIONAL (SHANGHAI) CORPORATION
To: SEMICONDUCTOR MANUFACTURING INTERNATIONAL (BEIJING) CORPORATION
Reel/Frame 029158/0666 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 19, 2009
From: LIN, JANG-SHEN
To: SEMICONDUCTOR MANUFACTURING INTERNATIONAL (SHANGHAI) CORPORATION
Reel/Frame 023116/0403 →