Inkjet printhead production method
View Patent ↗A method of producing an ink jet printhead includes steps of forming a substrate having defined therein a nozzle chamber for receiving and storing a fluid, the chamber fed at one side by an inlet passage; forming a nozzle plate in-situ on the substrate to define a nozzle opening on an opposite side of the nozzle chamber to the inlet passage; and forming first and second heater elements suspended between the nozzle opening and the inlet passage, the heater elements having two opposite planar sides and positioned to be in direct thermal contact with the fluid stored in the nozzle chamber at both opposed planar sides. The first heater element is formed on a different layer to the second heater element. The first heater element is formed with a surface area larger than that the second heater element.
1. A method of producing an ink jet printhead, the method comprising the steps of:
forming a substrate having defined therein a nozzle chamber for receiving and storing a fluid, the chamber fed at one side by an inlet passage;
forming a nozzle plate in-situ on the substrate to define a nozzle opening on an opposite side of the nozzle chamber to the inlet passage; and
forming first and second heater elements suspended between the nozzle opening and the inlet passage, the heater elements having two opposite planar sides and positioned to be in direct thermal contact with the fluid stored in the nozzle chamber at both opposed planar sides, wherein
the first heater element is formed on a different layer to the second heater element, and the first heater element is formed with a surface area larger than that the second heater element.
2. The method of claim 1 , wherein the nozzle plate is formed with a thickness of 2 to 2.5 microns.
3. The method of claim 1 , wherein the second heater element is formed above the first heater element with respect to the inlet passage.
4. The method of claim 1 wherein the nozzle plate is formed by chemical vapor deposition.
5. The method of claim 4 , wherein the chemical vapor deposition is of silicon nitride.
6. The method of claim 4 , wherein the chemical vapor deposition is of silicon dioxide.
7. The method of claim 4 , wherein the chemical vapor deposition is of oxi-nitride.
8. The method of claim 1 , wherein each heater element formed as a cantilevered beam suspended in the fluid in thermal contact therewith, and supported at one end by the nozzle chamber.
9. The method of claim 1 , wherein each heater element is formed to have a heated portion having a mass of less than 10 nanograms.
10. The method of claim 1 , further comprising a step of coating each heater element with a conformal protective coating, the step of coating applying the conformal protecting coating to all sides of the heater element substantially simultaneously.