NANOIMPRINTING MOLD AND MAGNETIC RECORDING MEDIA MANUFACTURED USING SAME
A mold for nanoimprinting is provided which enables excellent S/N ratios in magnetic recording media after pattern transfer. The mold includes: a base material; an intermediate layer disposed adjacent to the base material; and a pattern formation layer disposed adjacent to the intermediate layer and having a fine uneven pattern in the surface. The intermediate layer comprises an adhesive containing a silicone resin with ultraviolet ray transmission properties, the elastic modulus thereof is smaller than the elastic modulus of the base material, and moreover is smaller than the elastic modulus of the pattern formation layer.
1 . A mold for nanoimprinting, comprising:
a base material;
an intermediate layer disposed adjacent to the base material; and
a pattern formation layer disposed adjacent to the intermediate layer and having a fine uneven pattern in a surface of the pattern formation layer;
wherein the intermediate layer comprises an adhesive containing a silicone resin with ultraviolet ray transmission properties, and an elastic modulus thereof is smaller than an elastic modulus of the base material and moreover is smaller than an elastic modulus of the pattern formation layer.
2 . The mold for nanoimprinting according to claim 1 , wherein a thickness of the intermediate layer is 50 nm or greater.
3 . The mold for nanoimprinting according to claim 1 , wherein a thickness of the intermediate layer is less than or equal to 100 times the pattern width of the pattern formation layer.
4 . The mold for nanoimprinting according to claim 2 , wherein a thickness of the intermediate layer is less than or equal to 100 times the pattern width of the pattern formation layer.
5 . The mold for nanoimprinting according to claim 1 , wherein the pattern formation layer comprises a fluorine-containing resin.
6 . The mold for nanoimprinting according to claim 2 , wherein the pattern formation layer comprises a fluorine-containing resin.
7 . The mold for nanoimprinting according to claim 3 , wherein the pattern formation layer comprises a fluorine-containing resin.
8 . The mold for nanoimprinting according to claim 4 , wherein the pattern formation layer comprises a fluorine-containing resin.
9 . A method of manufacturing a mold for nanoimprinting, the method comprising:
forming an intermediate layer on a base material;
forming a resin film on the intermediate layer to form a stacked member;
placing a face of the resin film of the stacked member in opposition to an uneven pattern face of a parent mold;
pressing the parent mold against the resin film of the stacked member to transfer the uneven pattern to the face of the resin film to form a pattern formation layer; and
separating the parent mold from the pattern formation layer to obtain the mold;
wherein the intermediate layer comprises an adhesive containing a silicone resin with ultraviolet ray transmission properties, and an elastic modulus thereof is smaller than an elastic modulus of the base material and moreover is smaller than an elastic modulus of the pattern formation layer.
10 . The method of manufacturing a mold for nanoimprinting according to claim 9 , wherein a thickness of the intermediate layer is 50 nm or greater.
11 . The method of manufacturing a mold for nanoimprinting according to claim 9 , wherein a thickness of the intermediate layer is less than or equal to 100 times the pattern width of the pattern formation layer.
12 . The method of manufacturing a mold for nanoimprinting according to claim 10 , wherein a thickness of the intermediate layer is less than or equal to 100 times the pattern width of the pattern formation layer.
13 . The method of manufacturing a mold for nanoimprinting according to claim 9 , wherein the pattern formation layer comprises a fluorine-containing resin.
14 . The method of manufacturing a mold for nanoimprinting according to claim 10 , wherein the pattern formation layer comprises a fluorine-containing resin.
15 . The method of manufacturing a mold for nanoimprinting according to claim 11 , wherein the pattern formation layer comprises a fluorine-containing resin.
16 . The method of manufacturing a mold for nanoimprinting according to claim 12 , wherein the pattern formation layer comprises a fluorine-containing resin.
17 . A method of manufacturing a recording medium comprising:
opposing a surface of a resin film of a stacked member to a pattern face of a pattern formation layer of a mold;
pressing the mold against the resin film of the stacked member to transfer the uneven pattern to the surface of the resin film; and
separating the mold from the resin film;
wherein the mold includes an intermediate layer formed on a base material and a pattern formation layer formed on the intermediate layer; and
wherein the intermediate layer comprises an adhesive containing a silicone resin with ultraviolet ray transmission properties, and an elastic modulus thereof is smaller than an elastic modulus of the base material and moreover is smaller than an elastic modulus of the pattern formation layer.
18 . A recording medium manufactured by the process as claimed in claim 17 .