Coated Substrates and Semiconductor Devices Including the Substrates
A photovoltaic cell can include a substrate having a transparent conductive oxide layer and an antireflective layer. The layers can be deposited by sputtering or by chemical vapor deposition.
1 . A method of manufacturing an optical device substrate comprising:
depositing an antireflective layer on a first surface of the substrate by chemical vapor deposition; and
depositing a transparent conductive layer on a second surface of the substrate by sputtering.
2 . The method of claim 1 , wherein the substrate comprises glass.
3 . The method of claim 1 , wherein the optical device is a CdTe thin film Photovoltaic device.
4 . The method of claim 1 , wherein the transparent conductive layer comprises CdTe.
5 . The method of claim 1 , wherein the step of depositing an antireflective layer occurs before the step of depositing a transparent conductive layer.
6 . The method of claim 1 , wherein the step of depositing an antireflective layer occurs after the step of depositing a transparent conductive layer.
7 . The method of claim 1 , wherein the step of depositing an antireflective layer occurs substantially simultaneously with the step of depositing a transparent conductive layer.
8 . The method of claim 1 , wherein the step of depositing an antireflective layer comprises atmospheric pressure chemical vapor deposition.
9 . An optical device substrate comprising:
a substrate;
a sputtered transparent conductive layer in contact with a first surface of the substrate; and
an antireflective layer in contact with a second surface of the substrate.
10 . The optical device substrate of claim 9 , wherein the optical device substrate forms a photovoltaic device.
11 . The optical device substrate of claim 10 , wherein the photovoltaic device is a thin film photovoltaic device.
12 . The optical device substrate of claim 10 , wherein the photovoltaic device is a CdTe thin film photovoltaic device.
13 . The optical device substrate of claim 9 , wherein the transparent conductive layer is indium tin oxide.
14 . An optical device substrate comprising:
a substrate;
a sputtered transparent conductive layer in contact with a first surface of the substrate;
an active photovoltaic layer adjacent to the transparent conductive layer; and
an antireflective layer in contact with a second layer of the substrate.
15 . The optical device substrate of claim 14 , wherein the optical device substrate forms a photovoltaic device.
16 . The optical device substrate of claim 15 , wherein the photovoltaic device is a thin film photovoltaic device.
17 . The optical device substrate of claim 15 , wherein the photovoltaic device is a CdTe thin film photovoltaic device.
18 . The optical device substrate of claim 14 , wherein the transparent conductive layer is indium tin oxide.