Electrophoretic display device and method of fabricating the same
View Patent ↗An electrophoretic display device includes a gate line on a substrate, a common line parallel to the gate line, a gate insulating layer on the gate line and the common line, a data line on the gate insulating layer, the data line crossing the gate line to define a pixel region, a thin film transistor connected to the gate line and the data line, the thin film transistor including a gate electrode, a semiconductor layer, a source electrode and a drain electrode, a first storage electrode extending from the common line, a first passivation layer over the thin film transistor, the gate line and the data line, the first passivation layer exposing the drain electrode, and a pixel electrode on the first passivation layer, the pixel electrode contacting the drain electrode and overlapping the gate line and the data line, wherein the pixel electrode includes a second storage electrode overlapping the first storage electrode, and the first and second storage electrodes form a storage capacitor with the gate insulating layer interposed therebetween.
1. An electrophoretic display device, comprising:
a gate line on a substrate;
a common line parallel to the gate line;
a gate insulating layer on the gate line and the common line;
a data line on the gate insulating layer, the data line crossing the gate line to define a pixel region;
a thin film transistor connected to the gate line and the data line, the thin film transistor including a gate electrode, a semiconductor layer, a source electrode and a drain electrode;
a first storage electrode extending from the common line;
a first passivation layer over the thin film transistor, the gate line and the data line, the first passivation layer exposing the drain electrode; and
a pixel electrode on the first passivation layer, the pixel electrode contacting the drain electrode and overlapping the gate line and the data line, wherein the pixel electrode includes a second storage electrode overlapping the first storage electrode, and the first and second storage electrodes form a storage capacitor with the gate insulating layer interposed therebetween,
wherein the first storage electrode has a size more than a half of the pixel region.
2. The display device according to claim 1 , wherein the first passivation layer has a thickness of about 2 μm to about 4 μm.
3. The display device according to claim 1 , further comprising an electrophoresis film on the pixel electrode.
4. The display device according to claim 1 , further comprising a semiconductor pattern under the data line, wherein the semiconductor pattern is formed of a same material as the semiconductor layer.
5. The display device according to claim 1 , wherein an end of the pixel electrode is disposed in a next pixel region adjacent to the data line.
6. The display device according to claim 1 , wherein the first passivation layer is formed of an organic insulating material.
7. The display device according to claim 1 , wherein the pixel electrode has a size corresponding to substantially the entire portion of the pixel region.
8. An electrophoretic display device, comprising:
a gate line on a substrate;
a common line parallel to the gate line;
a gate insulating layer on the gate line and the common line;
a data line on the gate insulating layer, the data line crossing the gate line to define a pixel region;
a thin film transistor connected to the gate line and the data line, the thin film transistor including a gate electrode, a semiconductor layer, a source electrode and a drain electrode;
a first storage electrode extending from the common line;
a first passivation layer over the thin film transistor, the gate line and the data line, the first passivation layer exposing the drain electrode;
a pixel electrode on the first passivation layer, the pixel electrode contacting the drain electrode and overlapping the gate line and the data line, wherein the pixel electrode includes a second storage electrode overlapping the first storage electrode, and the first and second storage electrodes form a storage capacitor with the gate insulating layer interposed therebetween; and
a second passivation layer covering the thin film transistor and the data line and disposed between the thin film transistor and the first passivation layer, wherein the second passivation layer is formed of an inorganic insulating material and includes a drain contact hole exposing the drain electrode and the first and second storage electrodes form the storage capacitor with the gate insulating layer and the second passivation layer interposed therebetween.
9. An electrophoretic display device, comprising:
a gate line on a substrate;
a common line parallel to the gate line;
a gate insulating layer on the gate line and the common line;
a data line on the gate insulating layer, the data line crossing the gate line to define a pixel region;
a thin film transistor connected to the gate line and the data line, the thin film transistor including a gate electrode, a semiconductor layer, a source electrode and a drain electrode;
a first storage electrode extending from the common line;
a first passivation layer over the thin film transistor, the gate line and the data line, the first passivation layer exposing the drain electrode;
a pixel electrode on the first passivation layer, the pixel electrode contacting the drain electrode and overlapping the gate line and the data line, wherein the pixel electrode includes a second storage electrode overlapping the first storage electrode, and the first and second storage electrodes form a storage capacitor with the gate insulating layer interposed therebetween; and a second passivation layer on the first passivation layer, wherein the second passivation layer is formed of an inorganic insulating material and has a same cross-sectional shape as the first passivation layer.