IP Library Patent Application 12560266
Patent Application
App. No. 12/560,266

Multilayer Antireflection Layer, Method for Producing the Same, and Plastic Lens

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Quick Facts
Patent No.
US None
App. No.
12/560,266
Abstract

A multilayer antireflection layer includes a high refractive index layer and a low refractive index layer that are laminated alternately, the high reflective index layer having a grain boundary, and particles forming the grain boundary having an average particle diameter of 30 nm or less.

Claims (10)

1 . A multilayer antireflection layer comprising a high refractive index layer and a low refractive index layer that are laminated alternately,

the high reflective index layer having a grain boundary, and

particles forming the grain boundary having an average particle diameter of 30 nm or less.

2 . The layer according to claim 1 , wherein the average particle diameter of the particles forming the grain boundary is from 14 to 30 nm.

3 . The layer according to claim 1 , wherein the high refractive index layer contains at least one of zirconium oxide, tantalum oxide and niobium oxide.

4 . The layer according to claim 1 , wherein the low refractive index layer contains silicon oxide.

5 . A plastic lens comprising a plastic lens substrate having formed thereon the multilayer antireflection layer according to claim 1 .

6 . A method for producing the multilayer antireflection layer according to claim 1 , the method comprising:

forming the high refractive index layer by a dry film forming method.

7 . The method according to claim 6 , wherein the dry film forming method is an ion assisted vapor deposition method.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 10, 2013
From: SEIKO EPSON CORPORATION
To: HOYA LENS MANUFACTURING PHILIPPINES INC.
Reel/Frame 030768/0299 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 15, 2009
From: FUKUI, TOMOHITO; NISHIMOTO, KEIJI; NOGUCHI, TAKASHI
To: SEIKO EPSON CORPORATION
Reel/Frame 023236/0014 →