Composition for photoresist stripper and method of fabricating thin film transistor array substrate
View Patent ↗A composition for a photoresist stripper and a method of fabricating a thin film transistor array substrate are provided according to one or more embodiments. In one or more embodiments, the composition includes about 5-30 weight % of a chain amine compound, about 0.5-10 weight % of a cyclic amine compound, about 10-80 weight % of a glycol ether compound, about 5-30 weight % of distilled water, and about 0.1-5 weight % of a corrosion inhibitor.
1. A composition for a photoresist stripper comprising:
about 5-30 weight % of a chain amine compound;
about 0.5-10 weight % of a cyclic amine compound;
about 10-80 weight % of a glycol ether compound;
about 5-30 weight % of distilled water; and
about 0.1-5 weight % of a corrosion inhibitor.
2. The composition for a photoresist stripper according to claim 1 , wherein the chain amine compound is at least one selected from the group consisting of monoethanolamine, diethanolamine, triethanolamine, propanolamine, dipropanolamine, tripropanolamine, isopropanolamine, diisopropanolamine, triisopropanolamine, 2-(2-aminoethoxy)ethanol, 2-(2-aminoethoxy)ethanol, 2-(2-aminoethylamino)ethanol, N,N-dimethylethanol amine, N,N-diethylethanol amine, N-methylethanol amine, N-ethylethanol amine, N-butylethanol amine, and N-methyldiethanol amine.
3. The composition for a photoresist stripper according to claim 1 , wherein the cyclic amine compound is at least one selected from the group consisting of 1-[(2-amino ethyl)amino]2-propanol, 1-(2-hydroxyethyl)piperazine, 1-(2-aminoethyl)piperazine, 1-(2-hydroxyethyl)-4-methylpiperazine, N-(3-aminopropyl)morpholine, 2-methylpiperazine, 1-methylpiperazine, 4-amino-1-methylpiperazine, 1-benzylpiperazine and 1-phenylpiperazine.
4. The composition for a photoresist stripper according to claim 1 , wherein the glycol ether compound has a boiling point of 160° C. or higher.
5. The composition for a photoresist stripper according to claim 4 , wherein the glycol ether compound is at least one selected from the group consisting of ethylene glycol ethyl ether, ethylene glycol butyl ether, diethylene glycol methyl ether, diethylene glycol ethyl ether, diethylene glycol propyl ether, diethylene glycol butyl ether, triethylene glycol methyl ether, triethylene glycol ethyl ether, triethylene glycol butyl ether, triethylene glycol and tetraethylene glycol.
6. The composition for a photoresist stripper according to claim 1 , wherein the corrosion inhibitor is at least one selected from the group consisting of glucose, sugar alcohol, an aromatic hydroxyl compound, acetylenic alcohol, a carboxylic acid compound and anhydrides thereof, and a triazole compound.
7. The composition for a photoresist stripper according to claim 6 , wherein the corrosion inhibitor is at least one selected from the group consisting of sorbitol, xylitol, pyrocatechol, pyrogallol, gallic acid, 2-butien-1,4-diol, phthalic acid, phthalic anhydride, salicylic acid, ascorbic acid, tolyltriazole and benzotriazole.