IP Library Granted Patent US 7,969,541
Granted Patent B2
US 7,969,541 · App. 12/564,505 · Granted Jun 28, 2011

Retardation film, method of manufacturing the same, and display

Assignee: Sony Corporation
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Quick Facts
Patent No.
US 7,969,541
App. No.
12/564,505
Granted
Jun 28, 2011
Kind
B2
Abstract

A retardation film which is manufacturable by a simple process, and being capable of preventing a decline in light use efficiency is provided. A retardation film includes: a substrate having a plurality of grooves extending in a specific direction on a surface thereof; and a retardation layer arranged in contact with the surface of the substrate, and including a liquid crystal material, the liquid crystal material being aligned along the extending direction of the plurality of grooves and being polymerized.

Claims (65)

1. A method of manufacturing a retardation film comprising the steps of:

forming a metal mold in which a stripe-shaped pattern having a plurality of projections and depressions extending in a direction orthogonal to a polarization direction of a laser beam and crossing a scanning direction is drawn by irradiating a linear polarization laser beam to a surface of a base made of a metal material with the use of a femtosecond laser;

forming a plurality of grooves extending in a specific direction on a surface of a substrate with the use of the metal mold;

coating the surface on which the plurality of grooves are formed of the substrate with a liquid crystal material having polymerizability so that the liquid crystal material is arranged in contact with the surface of the substrate; and

polymerizing the liquid crystal material, wherein a pattern formed by the plurality of grooves has a periodic structure, and the periodic structure has a spread of approximately 2 to 10% in pitches of projections and depressions, and a spread of approximately 3 to 8% in angles of projections and depressions.

2. The method of manufacturing a retardation film according to claim 1

wherein

the metal mold is made of SUS or NiP.

3. The method of manufacturing a retardation film according to claim 1

wherein

the metal mold is made of SUS or NiP.

4. The method of manufacturing a retardation film according to claim 1 , wherein

the formation of the plurality of grooves using the metal mold is performed by thermal transfer or transfer using a 2P molding method.

5. The method of manufacturing a retardation film according to claim 1 , wherein

the formation of the plurality of grooves using the metal mold is performed by thermal transfer or transfer using a 2P molding method.

6. The method of manufacturing a retardation film according to claim 2 , wherein

the formation of the plurality of grooves using the metal mold is performed by thermal transfer or transfer using a 2P molding method.

7. The method of manufacturing a retardation film according to claim 1 , wherein

the metal mold includes a plurality of first grooves extending in a first direction and a plurality of second grooves extending in a second direction orthogonal to the first direction, and

first groove regions including the plurality of first grooves and second groove regions including the plurality of second grooves each have a stripe shape, and are alternately arranged.

8. The method of manufacturing a retardation film according to claim 1 , wherein

the metal mold includes a plurality of first grooves extending in a first direction and a plurality of second grooves extending in a second direction orthogonal to the first direction, and

first groove regions including the plurality of first grooves and second groove regions including the plurality of second grooves each have a stripe shape, and are alternately arranged.

9. The method of manufacturing a retardation film according to claim 2 , wherein

the metal mold includes a plurality of first grooves extending in a first direction and a plurality of second grooves extending in a second direction orthogonal to the first direction, and

first groove regions including the plurality of first grooves and second groove regions including the plurality of second grooves each have a stripe shape, and are alternately arranged.

10. The method of manufacturing a retardation film according to claim 3 , wherein

the metal mold includes a plurality of first grooves extending in a first direction and a plurality of second grooves extending in a second direction orthogonal to the first direction, and

first groove regions including the plurality of first grooves and second groove regions including the plurality of second grooves each have a stripe shape, and are alternately arranged.

11. The method of manufacturing a retardation film according to claim 1 , wherein

the substrate is made of a plastic material.

12. The method of manufacturing a retardation film according to claim 1 , wherein

the substrate is made of a plastic material.

13. The method of manufacturing a retardation film according to claim 2 , wherein

the substrate is made of a plastic material.

14. The method of manufacturing a retardation film according to claim 3 , wherein

the substrate is made of a plastic material.

15. The method of manufacturing a retardation film according to claim 4 , wherein

the substrate is made of a plastic material.

16. The method of manufacturing a retardation film according to claim 1 , wherein

the substrate is made of a base including a resin layer formed on a surface thereof.

17. The method of manufacturing a retardation film according to claim 1 , wherein

the substrate is made of a base including a resin layer formed on a surface thereof.

18. The method of manufacturing a retardation film according to claim 2 , wherein

the substrate is made of a base including a resin layer formed on a surface thereof.

19. The method of manufacturing a retardation film according to claim 3 , wherein

the substrate is made of a base including a resin layer formed on a surface thereof.

20. The method of manufacturing a retardation film according to claim 4 , wherein

the substrate is made of a base including a resin layer formed on a surface thereof.

21. The method of manufacturing a retardation film according to claim 5 , wherein

the substrate is made of a base including a resin layer formed on a surface thereof.

22. The method of manufacturing a retardation film according to claim 1 , wherein

the surface on which the plurality of grooves are formed of the substrate is coated with the liquid crystal material, and then a heating process is performed on the liquid crystal material at a temperature equal to or higher than a phase transition temperature between a liquid crystal phase and an isotropic phase of the liquid crystal material.

23. The method of manufacturing a retardation film according to claim 1 , wherein

the surface on which the plurality of grooves are formed of the substrate is coated with the liquid crystal material, and then a heating process is performed on the liquid crystal material at a temperature equal to or higher than a phase transition temperature between a liquid crystal phase and an isotropic phase of the liquid crystal material.

24. The method of manufacturing a retardation film according to claim 2 , wherein

the surface on which the plurality of grooves are formed of the substrate is coated with the liquid crystal material, and then a heating process is performed on the liquid crystal material at a temperature equal to or higher than a phase transition temperature between a liquid crystal phase and an isotropic phase of the liquid crystal material.

25. The method of manufacturing a retardation film according to claim 3 , wherein

the surface on which the plurality of grooves are formed of the substrate is coated with the liquid crystal material, and then a heating process is performed on the liquid crystal material at a temperature equal to or higher than a phase transition temperature between a liquid crystal phase and an isotropic phase of the liquid crystal material.

26. The method of manufacturing a retardation film according to claim 4 , wherein

the surface on which the plurality of grooves are formed of the substrate is coated with the liquid crystal material, and then a heating process is performed on the liquid crystal material at a temperature equal to or higher than a phase transition temperature between a liquid crystal phase and an isotropic phase of the liquid crystal material.

27. The method of manufacturing a retardation film according to claim 5 , wherein

the surface on which the plurality of grooves are formed of the substrate is coated with the liquid crystal material, and then a heating process is performed on the liquid crystal material at a temperature equal to or higher than a phase transition temperature between a liquid crystal phase and an isotropic phase of the liquid crystal material.

28. The method of manufacturing a retardation film according to claim 6 , wherein

the surface on which the plurality of grooves are formed of the substrate is coated with the liquid crystal material, and then a heating process is performed on the liquid crystal material at a temperature equal to or higher than a phase transition temperature between a liquid crystal phase and an isotropic phase of the liquid crystal material.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 23, 2013
From: SONY CORPORATION
To: DEXERIALS CORPORATION
Reel/Frame 029680/0585 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 23, 2009
From: OKUYAMA, KENTARO; KATAKURA, HITOSHI; OBATA, KEI; SHIMIZU, JUN; SUZUKI, SHINYA; HOSHI, MITSUNARI; INOUE, JUNICHI; KURIYAMA, AKITO
To: SONY CORPORATION
Reel/Frame 023415/0285 →
Priority Claims (3)
JP 2008-242203 · Sep 22, 2008 · national
JP 2008-305350 · Nov 28, 2008 · national
JP 2009-068706 · Mar 19, 2009 · national
Continuity (1)
Related Publication 20100073604A1 · Mar 25, 2010