IP Library Granted Patent US 8,899,957
Granted Patent B2
US 8,899,957 · App. 12/567,277 · Granted Dec 2, 2014

System, method and apparatus for manufacturing magnetic recording media

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Quick Facts
Patent No.
US 8,899,957
App. No.
12/567,277
Granted
Dec 2, 2014
Kind
B2
Abstract

A system, method and apparatus for manufacturing high density magnetic media is disclosed. A flexible mold having a very low modulus of less than about 4 GPa is made on a rigid support. The mold nano-imprints a resist material on disks for hard disk drives. The flexible mold may comprise a perfluoropolyether with urethane acrylate end groups with a low surface adhesion from which the cured resist is easily released.

Claims (17)

1. A system for imprint mold manufacturing of magnetic recording media, comprising:

an imprint mold having a rigid support material that is UV-transparent in a wavelength range of 250 to 400 nm and has a flat surface, and a flexible mold layer on the rigid support material and having a modulus of at least 10 MPa, and a Young's modulus of less than about 4 GPa, the flexible mold layer comprising a fluorohydrocarbon polymer;

placing the imprint mold in contact with a substrate having a void-free resin formation to form a topography on the substrate; and

the flexible mold layer has optically visible alignment targets that are placed in contact and aligned with the substrate based on the optically visible alignment targets, and the flexible mold layer has a topography that forms a pattern that is precise such that one standard deviation of patterned dimensions is less than 1 nm.

2. A system according to claim 1 , wherein the rigid support material is UV-transparent in a range of 130 to 400 nm, and the topography comprises grooves and holes having an aspect ratio of depth to width between 0.5 and 2.

3. A system according to claim 1 , wherein the flexible mold layer is cured by UV or heat, and has a surface energy of less than 20 mN/m.

4. A system according to claim 1 , further comprising removing the imprint mold from the substrate with resin remaining on the substrate with a compliment of the topography located on the imprint mold.

5. A system according to claim 1 , wherein the fluorohydrocarbon polymer has urethane acrylate (UA) end groups.

6. A system according to claim 1 , wherein the flexible mold layer comprises perfluoropolyether acrylate.

7. A system according to claim 6 , wherein the flexible mold layer is blended with at least one of mono-, di-, tri-, tetra-, and poly-functional fluorohydrocarbon with at least one acrylates, urethane acrylates pendant and end groups.

8. A system according to claim 1 , wherein the imprint mold imprints into resist, allows cure of the resist, and releases from the resist without loss of the topography.

9. A system for imprint mold manufacturing of magnetic recording media, comprising:

an imprint mold having a rigid support material with a flat surface and is UV-transparent in a wavelength range of 250 to 400 nm, and a flexible mold layer on the rigid support material and having a modulus of at least 10 MPa, and a Young's modulus of less than about 4 GPa, the flexible mold layer comprising a fluorohydrocarbon polymer and having a topography with a pattern of grooves and holes having an aspect ratio of depth to width between 0.5 and 2, and the pattern is precise such that one standard deviation of patterned dimensions is less than 1 nm;

the flexible mold layer comprises perfluoropolyether acrylate and is blended with at least one of mono-, di-, tri-, tetra-, and poly-functional fluorohydrocarbon with at least one acrylate, urethane acrylate pendant and end group;

placing the imprint mold in contact with a substrate having a void-free resin formation to form a topography on the substrate;

the flexible mold layer is cured by UV or heat, has a surface energy of less than 20 mN/m, and has optically visible alignment targets that are placed in contact and aligned with the substrate based on the optically visible alignment targets; and

removing the imprint mold from the substrate with resin remaining on the substrate with a compliment of the topography located on the imprint mold, such that the imprint mold imprints into the resin, allows cure of the resin, and releases from the resin without loss of the topography.

Assignments (7)
PATENT COLLATERAL AGREEMENT - DDTL LOAN AGREEMENT Recorded Aug 21, 2023
From: WESTERN DIGITAL TECHNOLOGIES, INC.
To: JPMORGAN CHASE BANK, N.A.
Reel/Frame 067045/0156 →
PATENT COLLATERAL AGREEMENT - A&R LOAN AGREEMENT Recorded Aug 21, 2023
From: WESTERN DIGITAL TECHNOLOGIES, INC.
To: JPMORGAN CHASE BANK, N.A.
Reel/Frame 064715/0001 →
RELEASE OF SECURITY INTEREST AT REEL 052915 FRAME 0566 Recorded Feb 8, 2022
From: JPMORGAN CHASE BANK, N.A.
To: WESTERN DIGITAL TECHNOLOGIES, INC.
Reel/Frame 059127/0001 →
SECURITY INTEREST Recorded Feb 6, 2020
From: WESTERN DIGITAL TECHNOLOGIES, INC.
To: JPMORGAN CHASE BANK, N.A., AS AGENT
Reel/Frame 052915/0566 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 6, 2016
From: HGST NETHERLANDS B.V.
To: WESTERN DIGITAL TECHNOLOGIES, INC.
Reel/Frame 040826/0821 →
CHANGE OF NAME Recorded Oct 25, 2012
From: HITACHI GLOBAL STORAGE TECHNOLOGIES NETHERLANDS B.V.
To: HGST NETHERLANDS B.V.
Reel/Frame 029341/0777 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 25, 2009
From: HENDERSON, CLAYTON; GUO, XING-CAI; KARIS, THOMAS; LILLE, JEFFREY; WU, TSAI-WEI
To: HITACHI GLOBAL STORAGE TECHNOLOGIES NETHERLANDS B.V.
Reel/Frame 023286/0588 →