Removable multilayer nail coating system and methods therefore

1. A multilayer nail covering system comprising at least a first layer and a second layer,

wherein at least one of the first and second layer is curable to an acrylic thermoset lattice layer covering a nail surface upon exposure to actinic radiation;

wherein at least one of the first or second layer comprises:

hydroxypropyl methacrylate (HPMA),

at least one reactive urethane (meth)acrylate, and

a sufficient amount of a non-reactive, solvent-dissolvable polymer and a non-reactive solvent such that, when cured to the nail surface, the system is removable from the nail surface within 20 minutes of exposure to organic solvent.

2. The nail covering system of claim 1 , wherein the at least one layer further comprises hydroxyethylmethacrylate (HEMA).

3. The nail covering system of claim 1 , wherein said non-reactive, solvent-dissolvable polymer is a cellulose ester.

4. The nail covering system of claim 3 , wherein said cellulose ester is a cellulose acetate alkylate.

5. The nail covering system of claim 4 , wherein said cellulose acetate alkylate is selected from the group consisting of cellulose acetate butyrate, cellulose acetate propionate, and mixtures thereof.

6. The nail covering system of claim 1 , wherein said non-reactive solvent is selected from the group consisting of ketones, alkyl acetates, alcohols, alkanes, alkenes, and mixtures thereof.

7. The nail covering system of claim 1 , wherein said non-reactive solvent is selected from the group consisting of acetone, ethyl acetate, butyl acetate, isopropyl alcohol, ethanol, methyl ethyl ketone, toluene, hexane, and mixtures thereof.

8. The nail covering system of claim 1 , wherein the at least one layer further comprises at least one photoinitiator.

9. The nail covering system of claim 8 , wherein said at least one photoinitiator is selected from the group consisting of benzoylphenylphosphinates, cyclohexylphenyl ketones, benzyl ketals, and mixtures thereof.

10. The nail covering system of claim 9 , wherein said at least one photoinitiator is selected from the group consisting of 2,4,6-trimethylbenzoyldiphenylphosphinate, hydroxycyclohexyl phenyl ketone, benzyl dimethyl ketal, and mixtures thereof.

11. The nail covering system of claim 1 , wherein the at least one layer further comprises at least one addition-polymerizable, ethylenically-unsaturated monomer.

12. The nail covering system of claim 1 , wherein upon exposure to actinic radiation, the at least one layer cures to an acrylic thermoset lattice layer having voids defined therein, wherein at least a portion of said voids contain said at least one non-reactive, solvent-dissolvable polymer.

13. The nail covering system of claim 1 , wherein said non-reactive, solvent-dissolvable polymer is present at from about 5 to about 90 wt %.

14. The nail covering system of claim 1 , wherein said non-reactive, solvent-dissolvable polymer is present at from about 20 to about 80 wt %.

15. The nail covering system of claim 1 , wherein said non-reactive, solvent-dissolvable polymer is present at from about 30 to about 70 wt %.

16. The nail covering system of claim 1 , wherein the organic solvent is acetone.

17. The nail covering system according to claim 1 , wherein the at least one layer further comprises an adhesion-promoting (meth)acrylate.

18. The nail covering system according to claim 17 , wherein said adhesion-promoting (meth)acrylate is selected from the group consisting of tetrahydrofurfural methacrylate, ethyl methacrylate, pyromellitic dianhydride glyceryl dimethacrylate, and mixtures thereof.

19. The nail covering system according to claim 1 , wherein the at least one layer further comprises pyromellitic glyceryl dimethacrylate.

20. The nail covering system according to claim 1 , wherein the at least one layer further comprises at least one polyalkylene glycol mono(meth)acrylate.

21. The nail covering system according to claim 20 , wherein said at least one polyalkylene glycol mono(meth)acrylate is a compound selected from the group consisting of polypropylene glycol monomethacrylates, polyethylene glycol monomethacrylates, and mixtures thereof.

22. The nail covering system of claim 1 , wherein said at least one urethane (meth)acrylate has a molecular weight of from about 300 to about 1,000.

23. The nail covering system of claim 1 , wherein the at least one layer further comprises at least one plasticizer having the general structure RCO—OR′ where RCO— represents a carboxylic acid radical, where —OR′ is an alcohol residue, and where R and R′ are fatty radicals having 6 to 30 saturated or unsaturated carbon atoms.

24. The nail covering system according to claim 1 , wherein the at least one layer further comprises a reactive (meth)acrylate monomer or polymer selected from the group consisting of: hydroxyethylmethacrylate (HEMA), ethyl methacrylate (EMA), tetrahydrofurfuryl methacrylate (THFMA), pyromellitic dianhydride di(meth)acrylate, pyromellitic dianhydride glyceryl dimethacrylate, pyromellitic dimethacrylate, methacroyloxyethyl maleate, 2-hydroxyethyl methacrylate/succinate, 1,3-glycerol dimethacrylate/succinate adduct, phthalic acid monoethyl methacrylate, acetoacetoxy ethyl methacylate (AAEMA), and mixtures thereof.

25. The nail covering system according to claim 1 , having a hardness of at least 3H on the pencil hardness test.

26. A nail covering system comprising: a basecoat layer; an intermediate layer; and a topcoat layer; wherein at least one layer comprises:

(a) hydroxypropyl methacrylate (HPMA);

(b) at least one reactive urethane (meth)acrylate;

(c) at least one non-reactive, solvent-dissolvable polymer; and

(d) at least one non-reactive solvent; and

wherein, upon exposure to actinic radiation, the at least one layer cures to an acrylic thermoset lattice layer covering a nail surface.