Thin-film transistor substrate and method of fabricating the same

1. A method of fabricating a TFT substrate, the method comprising:

forming a gate line on an insulating substrate, and forming a gate pad by extending an end of the gate line to be wider than the gate line in a first direction substantially perpendicular to a longitudinal direction of the gate line;

forming a gate insulating film on the gate line and the gate pad;

sequentially stacking a first semiconductor material layer and a second semiconductor material layer on the gate insulating film and forming a first photoresist layer on the second semiconductor material layer;

forming a contact hole which exposes a portion of the gate line extension portion, by etching the gate insulating film, the first semiconductor material layer, and the second semiconductor material layer using the first photoresist layer as an etching mask;

forming a data line including:

stacking a transparent conductive layer on the gate insulating film,

forming a data conductive layer directly on the transparent conductive layer, and

simultaneously patterning the transparent conductive layer and the data conductive layer; and

forming a pixel electrode which is electrically connected to the gate line and the data line by a switching device,

wherein the gate line and the data line are arranged in a lattice.

2. The method of claim 1 , wherein the switching device comprises a TFT including a gate electrode which is protruded from the gate line, a source electrode which is protruded from the data line, and a drain electrode which is electrically connected to the pixel electrode, and

further comprising forming a semiconductor layer and ohmic contact layers, which each overlap a portion of the gate electrode, by etching back to reduce a thickness of the first photoresist layer, and etching the first semiconductor material layer and the second semiconductor material layer.

3. The method of claim 2 , wherein the forming of the pixel electrode comprises:

stacking the transparent conductive layer on remnants of the gate insulating film and remnants of the first photoresist layer; and

lifting off the remnants of the first photoresist layer.

4. The method of claim 3 , wherein the forming of the data line comprises:

forming the data conductive layer on the transparent conductive layer and the ohmic contact layers;

forming a second photoresist layer on the data conductive layer; and

etching the data conductive layer by using the second photoresist layer as an etching mask.

5. The method of claim 4 , further comprising exposing the pixel electrode by etching back to reduce a thickness of the second photoresist layer, and removing a portion of the data conductive layer disposed on the pixel electrode.

6. The method of claim 2 , wherein a portion of the drain electrode is disposed overlapping with the pixel electrode.

7. The method of claim 2 , further comprising forming a passivation layer on the TFT and the pixel electrode.

8. The method of claim 7 , wherein the passivation layer exposes a portion of the pixel electrode.

9. The method of claim 2 , wherein the semiconductor layer does not overlap the data line.

10. The method of claim 1 , further comprising:

forming a gate pad by widening the end of the gate line in the first direction;

forming a gate pad extension portion overlapping the gate pad; and

forming a connection electrode of a transparent electrode, the connection electrode connecting the gate pad to the gate pad extension portion.

11. The method of claim 10 , further comprising forming a semiconductor pattern which overlaps a portion of the gate pad extension portion.