Semiconductor device and manufacturing method thereof
View Patent ↗On the top surface of a thin semiconductor wafer, top surface structures forming a semiconductor chip are formed. The top surface of the wafer is affixed to a supporting substrate with a double-sided adhesive tape. Then, from the bottom surface of the thin semiconductor wafer, a trench, which becomes a scribing line, is formed by wet anisotropic etching so that side walls of the trench are exposed. On the side walls of the trench with the crystal face exposed, an isolation layer with a conductivity type different from that of the semiconductor wafer for holding a reverse breakdown voltage is formed simultaneously with a collector region of the bottom surface diffused layer by ion implantation, followed by annealing with laser irradiation. The side walls form a substantially V-shaped or trapezoidal-shaped cross section, with an angle of the side wall relative to the supporting substrate being 30-70°. The double-sided adhesive tape is then removed from the top surface to produce semiconductor chips. With such a manufacturing method, a reverse-blocking semiconductor device having high reliability can be formed.
1. A method of manufacturing a semiconductor device, the method comprising the steps of:
forming a trench having a substantially V-shaped or trapezoidal-shape cross section, in a second principal surface of a first conductivity type semiconductor substrate having a first principal surface and the second principal surface;
introducing a second conductivity type impurity into a side wall of the trench; and
activating the impurity by laser irradiation,
wherein the side wall of the trench is formed so as to have an angle of inclination of over 30° and under 70° relative to the first principal surface,
wherein the laser irradiation is carried out with a laser beam made incident to the side wall of the trench, with the laser beam being incident to the second principal surface of the semiconductor substrate at an angle of incidence of ±30° off a normal to the second principal surface, and
wherein the laser irradiation is carried out with a focus point of the laser beam being incident to the side wall of the trench so that no molten crystal mark or work mark appears on the second principal surface of the semiconductor substrate.
2. The method of manufacturing a semiconductor device according to claim 1 , wherein a crystal face of each of the first and second principal surfaces of the semiconductor substrate is a {100} plane, and a crystal face of the side wall of the trench is a {111} plane.
3. A method of manufacturing a semiconductor device, the method comprising the steps of:
forming a trench having a substantially V-shaped or trapezoidal-shape cross section, in a second principal surface of a first conductivity type semiconductor substrate having a first principal surface and the second principal surface;
introducing a second conductivity type impurity into a side wall of the trench; and
activating the impurity by laser irradiation,
wherein the side wall of the trench is formed so as to have an angle of inclination of over 30° and under 70° relative to the first principal surface,
wherein a crystal face of each of the first and second principal surfaces of the semiconductor substrate is a {100} plane, and a crystal face of the side wall of the trench is a {111} plane
wherein the laser irradiation is carried out with a focus point of the laser beam being incident to the side wall of the trench so that no molten crystal mark or work mark appears on the second principal surface of the semiconductor substrate.
4. The method of manufacturing a semiconductor device according to claim 1 , wherein the trench is within the first conductivity type semiconductor substrate.
5. The method of manufacturing a semiconductor device according to claim 3 , wherein the trench is within the first conductivity type semiconductor substrate.
6. The method of manufacturing a semiconductor device according to claim 1 , wherein the second conductivity type impurity in the side wall of the trench is an isolation layer.
7. The method of manufacturing a semiconductor device according to claim 3 , wherein the second conductivity type impurity in the side wall of the trench is an isolation layer.