Refractory metal nitride capped electrical contact and method for frabricating same
According to one disclosed embodiment, an electrical contact for use on a semiconductor device comprises an electrode stack including a plurality of metal layers and a capping layer formed over the plurality of metal layers. The capping layer comprises a refractory metal nitride. In one embodiment, a method for fabricating an electrical contact for use on a semiconductor device comprises forming an electrode stack including a plurality of metal layers over the semiconductor device, and depositing a refractory metal nitride capping layer of the electrode stack over the plurality of metal layers. The method may further comprise annealing the electrode stack at a temperature of less than approximately 875° C. In some embodiments, the method may additionally include forming one of a Schottky metal layer and a gate insulator layer between the electrode stack and the semiconductor device.
1. An electrical contact for use on a semiconductor device, said electrical contact comprising:
an electrode stack including a plurality of metal layers and a capping layer formed over said plurality of metal layers;
said capping layer consisting only of a refractory metal nitride, said refractory metal nitride forming a top of said electrical contact and having a thickness greater than that of a bottommost layer of said plurality of metal layers.
2. The electrical contact of claim 1 , wherein said capping layer comprises titanium nitride (TiN).
3. The electrical contact of claim 1 , wherein said capping layer comprises tantalum nitride (TaN).
4. The electrical contact of claim 1 , wherein said plurality of metal layers includes respective first, second, and third metal layers, wherein said second metal layer is formed between said first metal layer and said third metal layer, and said capping layer is formed on said third metal layer.
5. The electrical contact of claim 4 , wherein said first metal layer and said third metal layer of said electrode stack comprise titanium (Ti).
6. The electrical contact of claim 4 , wherein said second metal layer of said electrode stack comprises aluminum (Al).
7. The electrical contact of claim 6 , wherein said second metal layer of said electrode stack further comprises silicon (Si).
8. The electrical contact of claim 1 , wherein said electrical contact is configured for implementation on a group III-V semiconductor device.
9. The electrical contact of claim 8 , wherein said group III-V semiconductor device comprises a high electron mobility transistor (HEMT).
10. The electrical contact of claim 8 , wherein said electrical contact is implemented as a power electrode making ohmic contact with said group III-V semiconductor device.
11. The electrical contact of claim 8 , wherein said electrical contact is implemented as a gate electrode making Schottky contact with said group III-V semiconductor device.
12. The electrical contact of claim 8 , wherein said electrical contact is implemented with a gate insulator layer underlying said first metal layer of said electrode stack to provide an insulated gate electrode for said group III-V semiconductor device.
13. An electrical contact for use on a group III-V semiconductor device, said electrical contact comprising:
an electrode stack including a plurality of metal layers and a capping layer formed over said plurality of metal layers;
said capping layer consisting only of a metal selected from the group consisting of titanium nitride (TiN) and tantalum nitride (TaN), said metal forming a top of said electrical contact and having a thickness greater than that of a bottommost layer of said plurality of metal layers.
14. The electrical contact of claim 13 , wherein said group III-V semiconductor device comprises a high electron mobility transistor (HEMT).
15. The electrical contact of claim 13 , wherein said electrical contact is implemented as a power electrode making ohmic contact with said group III-V semiconductor device.
16. The electrical contact of claim 13 , wherein said electrical contact is implemented as a gate electrode making Schottky contact with said group III-V semiconductor device.
17. The electrical contact of claim 13 , wherein said electrical contact is implemented with a gate insulator layer underlying a first metal layer of said electrode stack to provide an insulated gate electrode for said group III-V semiconductor device.