Apparatus for forming a nanoscale semiconductor structure on a substrate by applying a carrier fluid

1. An apparatus comprising:

a carrier fluid delivery mechanism;

an electric field source;

an energy source; and

a protective coating application mechanism that applies a protective coating to a plurality of nanoparticles;

wherein the carrier fluid delivery mechanism applies a carrier fluid carrying the plurality of nanoparticles to a substrate, the electric field source manipulates the positions of the nanoparticles on the substrate by dielectrophoresis, and the energy source removes the carrier fluid from the substrate and the protective coating from the nanoparticles, so as to leave the nanoparticles on the substrate, and sinter the nanoparticles; and

wherein the carrier fluid delivery mechanism comprises an inkjet printer.

2. The apparatus of claim 1 , wherein the energy source emits electromagnetic radiation in the infra-red band.

3. The apparatus of claim 1 , further comprising:

a mold structure, wherein the mold structure is configured to contain the carrier fluid on the substrate.

4. The apparatus of claim 1 , further comprising:

a temperature control mechanism, wherein the temperature control mechanism is connected to control the temperature of the substrate.

5. The apparatus of claim 1 , wherein the protective coating comprises a monomer or polymer coating.

6. The apparatus of claim 1 , wherein the nanoparticles comprise semiconductor nanoparticles.

7. The apparatus of claim 6 , wherein the nanoparticles comprise n-doped nanoparticles and p-doped nanoparticles and the sintered nanoparticles form a semiconducting n-region and a semiconducting p-region.

8. The apparatus of claim 6 , further comprising:

a dielectric region on a surface of the sintered nanoparticles; and

a metal contact on a surface of the dielectric region.