R-Fe-B based sintered magnet having on the surface thereof vapor deposited film of aluminum or alloy thereof, and method for producing the same
View Patent ↗An R—Fe—B sinlered magnet having on the surface thereof a vapor deposited film of aluminum or an alloy thereof and a method for producing the same. The vapor deposited film of aluminum or an alloy thereof comprises a columnar crystalline structure grown broader from the surface of the R—Fe—B sintered magnet body outward to the outer surface, which has a part within a region defined in the thickness direction of the film as taken from the surface of the R—Fe—B sintered magnet to ⅓ of the film thickness, 5 to 30 intercrystalline gaps of 0.01 μm to 1 μm in width as counted per 10 μm length in the lateral direction of the film. The method comprises controlling the average film formation rate such that it is slower up to a predetermined point and then is speeded up later thereon.
1. An R—Fe—B based sintered magnet having on its surface a vapor deposited film of aluminum or an alloy thereof, characterized in that the vapor deposited film of aluminum or an alloy thereof comprises a columnar crystalline structure grown broader from the surface of the R—Fe—B based sintered magnet outward to an outer surface of the vapor deposited film aluminum or an alloy thereof, wherein the vapor deposited film of aluminum or an alloy thereof has a part within a region defined in the thickness direction of the film as taken from the surface of the bulk magnet body to ⅓ of the film thickness, the part having 5 to 30 intercrystalline gaps of 0.01 μm to 1 μm in width as counted per 10 μm length in the lateral direction of the film.
2. The magnet as claimed in claim 1 , characterized in that a width of the crystal in the columnar crystalline structure is 0.1 μm to 1 μm in the part within the region defined in the thickness direction of the film as taken from the surface of the magnet body to ⅓ of the film thickness, and that a width of the crystal in the columnar crystalline structure is 1 μm to 5 μm in a second part within the region of the remaining ⅔ in the thickness direction of the film.
3. The magnet as claimed in claim 2 , characterized in that the vapor deposited film of aluminum or an alloy thereof is 3 μm to 20 μm in thickness.
4. A method for producing an R—Fe—B based sintered magnet having on its surface a vapor deposited film of aluminum or an alloy thereof described in claim 1 , characterized in that, on forming the vapor deposited film of aluminum or an alloy thereof on the surface of the R—Fe—B based sintered magnet, an average film formation rate is controlled to be set to a range of 0.1 μm/minute to 0.4 μm/minute until the film thickness reaches ⅓ of the desired thickness of the film, and the average film formation rate is thereafter set to a range of 0.2 μm/minute to 1 μm/minute, the latter rate being higher than the former rate.
5. The production method as claimed in claim 4 , characterized in that an apparatus for forming a vapor deposited film is used, in which a vapor deposition source of aluminum or an alloy thereof is supplied to an evaporating section for a vapor deposition material by wire feed method, and the vapor deposition source of aluminum or an alloy thereof is evaporated by resistance heating method in the evaporating section.
6. The magnet as claimed in claim 1 , characterized in that the vapor deposited film of aluminum or an alloy thereof is 3 μm to 20 μm in thickness.