IP Library Granted Patent US 8,409,308
Granted Patent B2
US 8,409,308 · App. 12/601,725 · Granted Apr 2, 2013

Process for manufacturing polishing pad

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Quick Facts
Patent No.
US 8,409,308
App. No.
12/601,725
Granted
Apr 2, 2013
Kind
B2
Abstract

A method for manufacturing a polishing pad that has a high level of optical detection accuracy and is prevented from causing slurry leak from between the polishing region and the light-transmitting region includes preparing a cell-dispersed urethane composition by a mechanical foaming method; placing a light-transmitting region at a predetermined position on a face material or a belt conveyor, continuously discharging the cell-dispersed urethane composition onto a part of the face material or the belt conveyor where the light-transmitting region is not placed; placing another face material or belt conveyor on the discharged cell-dispersed urethane composition; curing the cell-dispersed urethane composition to form a polishing region including a polyurethane foam, so that a polishing sheet is prepared; applying a coating composition containing an aliphatic and/or alicyclic polyisocyanate to one side of the polishing sheet and curing the coating composition to form a water-impermeable film; and cutting the polishing sheet.

Claims (9)

1. A method for manufacturing a polishing pad, comprising the steps of:

preparing a cell-dispersed urethane composition by a mechanical foaming method;

placing a light-transmitting region at a predetermined position on a face material or a belt conveyor, while feeding or moving the face material or the belt conveyor;

continuously discharging the cell-dispersed urethane composition onto a part of the face material or the belt conveyor where the light-transmitting region is not placed;

placing another face material or another belt conveyor on the discharged cell-dispersed urethane composition;

curing the cell-dispersed urethane composition to form a polishing region comprising a polyurethane foam, while its thickness is controlled to be uniform, so that a polishing sheet is prepared;

applying, after removing the face material or the belt conveyor from the polishing sheet, a polyurethane resin coating composition containing an aliphatic and/or alicyclic polyisocyanate to a side of the polishing sheet from which the face material or the belt conveyor is removed and curing the polyurethane resin coating composition to form a water-impermeable film; and

cutting the polishing sheet.

2. The method of claim 1 , wherein the water-impermeable film has a thickness of 20 μm to 100 μm.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 21, 2016
From: TOYO TIRE & RUBBER CO., LTD.
To: ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, INC.
Reel/Frame 038053/0218 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 9, 2009
From: SATO, AKINORI; HIROSE, JUNJI; NAKAMURA, KENJI; FUKUDA, TAKESHI; DOURA, MASATO
To: TOYO TIRE & RUBBER CO., LTD.
Reel/Frame 023630/0467 →