Method and apparatus for fabricating a precision optical surface
View Patent ↗A method involves forming a first surface on a substrate, applying to the first surface a layer of a material having a thickness less than approximately 10 microns, and precision polishing the layer of material to form a precision optical second surface on a side of the layer opposite from the substrate. A different aspect involves an apparatus that includes a substrate having a first surface, and a layer provided on the surface and having a thickness less than approximately 10 microns, the layer having on a side thereof opposite from the substrate a polished second surface with an RMS surface roughness less than approximately 10 Angstroms.
1. A method comprising:
forming a first surface on a substrate;
applying to said first surface a layer of a material having a thickness less than approximately 10 microns;
after said applying, hardening said layer by progressively raising the temperature of said substrate and said layer from an ambient temperature to a selected temperature during a selected period of time, and thereafter maintaining said substrate and said layer at approximately said selected temperature for a selected interval of time; and
after said hardening, precision polishing said layer of material to form a precision optical second surface on a side of said layer opposite from said substrate.
2. A method according to claim 1 , including:
carrying out said applying using a nickel phosphorus alloy as said material;
selecting approximately 750° F. as said selected temperature;
selecting approximately 45 minutes as said selected period of time; and
selecting approximately 1 hour as said selected interval of time.
3. A method according to claim 1 , including carrying out said applying using a nickel phosphorus alloy as said material.
4. A method according to claim 3 , wherein said applying of said layer on said first surface is carried out using an electroless plating process.
5. A method according to claim 4 , including cleaning said first surface after said forming and before said applying.
6. A method according to claim 1 , wherein said forming of said first surface is carried out in a manner so that said surface has an RMS surface roughness less than approximately 100 Angstroms.
7. A method according to claim 6 , wherein said forming of said first surface includes diamond point machining said first surface.
8. A method according to claim 1 , wherein said precision polishing includes:
precision measuring of said second surface; and
thereafter precision finishing of said second surface.
9. A method according to claim 8 , wherein said precision measuring includes carrying out full-surface optical interferometry.
10. A method according to claim 8 , wherein said precision finishing includes carrying out magnetorheological finishing.
11. A method according to claim 1 , including applying over said second surface after said precision polishing a layer of a reflective material.
12. A method according to claim 11 , including selecting as said reflective material one of aluminum, silver and gold.
13. A method according to claim 11 , including applying over said layer of reflective material a layer of a protective material.
14. A method according to claim 13 , including selecting as said protective material one of zinc sulphide and silicon dioxide.
15. A method according to claim 1 , wherein said applying is carried out in a manner so that said thickness of said layer of a material is less than approximately 5 microns.