Granted Patent B1

US 8,322,023 · App. 12/615,544 · Granted Dec 4, 2012

Abstract

Claims (42)

1. A method for fabricating a magnetic transducer having a pole including a pole tip and a flared region, the method comprising:

providing a first mask layer on the pole, the first mask layer being soluble in a predetermined solution and having a first thickness;

providing a second mask layer on the first mask layer, the second mask layer having a second thickness greater than the first thickness;

forming a mask from the first mask layer and the second mask layer, the step of forming the mask layer comprising using the predetermined solution, the mask having a pattern exposing a portion of the pole tip and covering a portion of the flared region; and

providing a wrap-around shield on at least the pole tip.

2. The method of claim 1 wherein the first mask layer includes a polydimethylglutarimide (PMGI) layer.

3. The method of claim 1 wherein the second mask layer is a photoresist mask layer.

4. The method of claim 3 wherein the step of forming the mask further includes:

exposing a portion of the second mask layer to light; and

immersing the portion of the second mask layer and a portion of the mask layer in a developer to remove immersed portions of the first mask layer and the second mask layer.

5. The Method of claim 4 wherein after removing the immersed portions, the exposed portion of the pole tip is free of photoresist residue.

6. The method of claim 1 wherein the predetermined solution is a developer.

7. The method of claim 1 wherein the pole includes a plurality of sides, wherein the magnetic transducer further includes a nonmagnetic layer on at least the plurality of sides of the pole and wherein the step of providing the wrap-around shield further comprising:

depositing a magnetic layer on the nonmagnetic layer.

8. The method of claim 7 wherein the step of depositing the magnetic layer further comprising:

electroplating the magnetic layer.

9. The method of claim 1 wherein the first thickness is at least ten nanometers.

10. The method of claim 9 wherein the first thickness is not more than one hundred nanometers.

11. The method of claim 1 wherein the first thickness is at least thirty nanometers and not more than fifty nanometers.

12. The method of claim 1 wherein the second thickness is at least two micrometers.

13. The method of claim 1 further comprising:

removing the mask after the wrap-around shield is provided.

14. The method of claim 13 wherein after removing the mask, the pole is free of photoresist residue.

15. The method of claim 1 wherein the step of providing the first mask layer further comprises spin coating the first mask layer.

16. The method of claim 1 wherein the pole has a bottom and a top wider than the bottom.

17. The method of claim 1 further comprising:

depositing a write gap before the wrap-around shield is provided.

18. The method of claim 1 further comprising:

depositing a nonmagnetic intermediate layer;

forming a trench in the nonmagnetic intermediate layer;

providing a liner, a portion of the liner residing in the trench;

depositing at least one pole material;

planarizing the at least one pole material to form the pole; and

removing a portion of the nonmagnetic intermediate layer adjoining the liner.

19. The method of claim 1 wherein the second thickness is at least twenty times the first thickness.

20. A method for fabricating a magnetic transducer having a pole including a pole tip and a flared region, the pole tip having a bottom and a top wider than the bottom, the method comprising:

providing a polydimethylglutarimide (PMGI) layer over the pole, the PMGI layer having a first thickness of at least ten nanometers and not more than sixty nanometers;

providing a photoresist layer on the PMGI layer, the photoresist layer having a second thickness of at least one micrometer;

exposing a portion of the photoresist layer above the pole tip to light;

exposing the photoresist layer and the PMGI layer to a developer, the PMGI layer being soluble in the developer such that the portion of the photoresist layer and a portion of the PMGI layer under the portion of the photoresist layer is removed;

depositing a write gap; and

providing a wrap-around shield on the pole tip.

Assignments (9)