System for endometrial ablation utilizing radio frequency
Methods, systems and devices for endometrial ablation. In accordance with a method, a working end of an RF ablation device is positioned in a patient uterus to contact endometrial tissue, the working end comprising a dielectric. Radiofrequency energy is applied for a first interval of time at constant power, the power being sufficient to capacitively couple current across the dielectric to the contacted endometrial tissue. A voltage parameter measured within the first interval, and radiofrequency energy is applied at a constant voltage over a second, treatment interval to ablate endometrial tissue, the constant voltage being related to the recorded voltage.
1. An electrosurgical system for endometrial ablation, comprising:
an ablation device configured for positioning in a uterine cavity, the ablation device comprising a dielectric wall, wherein the wall surrounds an interior and is expandable within the uterine cavity to contact endometrial tissue;
a radiofrequency power supply connected to the ablation device, wherein the radiofrequency power supply is configured to operate in a constant power mode, the constant power mode delivering sufficient energy to the interior to capacitively couple current from the interior across the dielectric wall to endometrial tissue.
2. The electrosurgical system of claim 1 , wherein the radiofrequency power supply is further adapted to operate in a constant voltage mode and the constant voltage mode delivers energy based on an electrical parameter recorded by the system.
3. The electrosurgical system of claim 2 , wherein the electrical parameter comprises a voltage parameter or an impedance parameter.
4. The electrosurgical system of claim 3 , wherein the voltage parameter comprises a recorded voltage measured at a single point in time.
5. The electrosurgical system of claim 3 , wherein the voltage parameter corn rises multiple recorded voltages recorded during a first interval and averaged.
6. The electrosurgical system of claim 3 , wherein the voltage parameter comprises a change in voltage over a first interval.
7. The electrosurgical system of claim 3 , wherein the voltage parameter corn rises a rate of change of voltage over a first interval.