IP Library Granted Patent US 8,304,772
Granted Patent B2
US 8,304,772 · App. 12/620,102 · Granted Nov 6, 2012

Thin-film transistor array panel and method of fabricating the same

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Quick Facts
Patent No.
US 8,304,772
App. No.
12/620,102
Granted
Nov 6, 2012
Kind
B2
Abstract

A thin-film transistor array panel and a manufacturing method thereof are provided for one or more embodiments. The thin-film transistor array panel may include: a substrate; a gate electrode formed on the substrate; a gate insulating layer formed on the gate electrode; a source electrode and a drain electrode formed on the gate insulating layer; and a flatness layer formed on the source electrode and the drain electrode, wherein the drain electrode has a higher height than the flatness layer.

Claims (26)

1. A thin-film transistor array panel comprising:

a substrate;

a gate electrode formed on the substrate;

a gate insulating layer formed on the gate electrode;

a source electrode and a drain electrode formed on the gate electrode such that the lowest portions of the source electrode and the drain electrode cover the gate electrode;

an insulating layer formed on the source electrode; and

a contact hole formed through the insulating layer exposing a top surface of the drain electrode,

wherein the insulating layer is made of organic insulating material; and

wherein the top surface of the drain electrode has a higher height than a top surface of a portion of the insulating layer adjacent to the drain electrode at a bottom surface of the contact hole.

2. The thin-film transistor array panel of claim 1 , wherein the source electrode encloses the drain electrode.

3. The thin-film transistor array panel of claim 1 , wherein the source electrode partially encloses the drain electrode.

4. The thin-film transistor array panel of claim 1 , further comprising:

a pixel electrode contacting an upper surface of the drain electrode.

5. The thin-film transistor array panel of claim 1 , further comprising a passivation layer formed on the source electrode, wherein the insulating layer is formed on the passivation layer.

6. The thin-film transistor array panel of claim 1 , wherein at least one of a transverse length and a longitudinal length of the drain electrode is in a range of 2-16 μm.

7. The thin-film transistor array panel of claim 1 , wherein the source electrode and the drain electrode have a height of more than 1 μm.

8. The thin-film transistor array panel of claim 1 , wherein a height of the source electrode is less than the height of the drain electrode.

9. The thin-film transistor array panel of claim 1 , further comprising a color filter formed on the substrate.

10. The thin-film transistor array panel of claim 1 , wherein the thin-film transistor array panel forms part of a liquid crystal display device, the liquid crystal display device further comprising:

a second substrate;

a liquid crystal layer interposed between the substrate in the thin-film transistor array panel and the second substrate; and

wherein the second substrate includes an upper panel comprising:

a black matrix disposed on the second substrate;

an overcoat disposed on the black matrix; and

a common electrode disposed on the overcoat.

11. The thin-film transistor array panel of claim 1 , wherein the insulating layer is flat except for the portion adjacent to the drain electrode.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 25, 2012
From: SAMSUNG ELECTRONICS CO., LTD.
To: SAMSUNG DISPLAY CO., LTD.
Reel/Frame 029016/0057 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 17, 2009
From: YOON, YEO-GEON; HUR, MYUNG-KOO; CHOI, SANG-GUN; KIM, JOO-HAN; LEE, CHEON-GON; BANG, JUNG-SUK
To: SAMSUNG ELECTRONICS CO., LTD.
Reel/Frame 023529/0821 →