Image display device, image display system, and methods for fabricating the same
View Patent ↗A display device including a display panel is provided, including a substrate having a luminance region and a none-luminance region thereover. An interlayer dielectric layer is disposed over the substrate. A reflection layer is disposed over the interlayer dielectric layer in the luminance region. A planarization layer is disposed over the reflection layer, having a rugged top surface corresponding to the reflection layer. A first electrode is disposed over the planarization layer, having a rugged top surface corresponding to the reflection layer. A pixel defining layer is disposed over the planarization layer, exposing the rugged top surface of the first electrode and defining the luminance region. An electroluminescent layer and a second electrode are sequentially stacked over the first electrode.
1. An image display device including a display panel, comprising:
a substrate having a luminance region and a none-luminance region thereover;
an interlayer dielectric layer disposed over the substrate;
a reflection layer disposed over the interlayer dielectric layer in the luminance region, wherein the reflection layer does not extend to electrically connect to any other structure;
a planarization layer disposed over the reflection layer, having a rugged top surface corresponding to the reflection layer, wherein the reflection layer is completely electrically insulated from other structure by the planarization layer and the interlayer dielectric layer;
a first electrode disposed over the planarization layer, having a rugged top surface corresponding to the reflection layer;
a pixel defining layer disposed over the planarization layer, exposing the rugged top surface of the first electrode and defining the luminance region; and
an electroluminescent layer and a second electrode sequentially stacked over the first electrode.
2. The image display device as claimed in claim 1 , further comprising:
a thin film transistor disposed under the interlayer dielectric layer and in the non-luminance region, having a source/drain region; and
a conductive layer disposed in the non-luminance region and over the interlayer dielectric layer, wherein a first opening is formed in the interlayer dielectric layer and the conductive layer is coupled to the source/drain region via the first opening.
3. The image display device as claimed in claim 2 , wherein the planarization layer is formed with a second opening, and the first electrode is coupled to the conductive layer via the second opening.
4. The image display device as claimed in claim 2 , wherein the conductive layer and the reflection layer comprise same material.
5. The image display device as claimed in claim 1 , wherein the electroluminescent layer and the second electrode respectively have a rugged top surface corresponding to the reflection layer.
6. The image display device as claimed in claim 1 , wherein the first electrode is an anode, the second electrode is a cathode, and the first, second electrodes and the electroluminescent layer form a light emitting element.
7. The image display device as claimed in claim 1 , wherein the reflection layer has a planar top surface.
8. A method for fabricating an image display device, comprising:
forming an interlayer dielectric layer over a substrate, wherein the substrate has a luminance region and a non-luminance region thereover;
forming a reflection layer over the interlayer dielectric layer in the luminance region;
forming a planarization layer over the reflection layer;
forming at the top of the planarization layer a rugged top surface corresponding to the reflection layer, comprising:
forming a resist layer with an opening therein over the planarization layer, wherein the opening substantially aligns to the reflection layer and exposes a portion of a top surface of the planarization layer;
treating the portion of the top surface of the planarization layer exposed by the opening, using the resist layer as a mask, thereby forming the rugged top surface on top of the substrate; and
removing the resist layer;
forming a first electrode over the planarization layer, having a rugged top surface corresponding to the reflection layer;
forming a pixel defining layer disposed over the planarization layer, exposing the rugged top surface of the first electrode and defining the luminance region; and
sequentially stacking an electroluminescent layer and a second electrode over the first electrode.
9. The method as claimed in claim 8 , further comprising:
providing a thin film transistor (TFT) in the non-luminance region, wherein the TFT is formed under the interlayer dielectric layer and has a source/drain region; and
forming a conductive layer in the non-luminance region and over the interlayer dielectric layer, wherein the interlayer dielectric is formed with a first opening and the conductive layer is coupled to the source/drain region via the first opening.
10. The method as claimed in claim 9 , wherein the planarization layer is formed with a second opening, and the first electrode is coupled to the conductive layer via the second opening.
11. The method as claimed in claim 9 , wherein the electroluminescent layer and the second electrode respectively have a rugged top surface corresponding to the reflection layer.
12. The method as claimed in claim 8 , wherein the conductive layer and the reflection layer comprise same material.
13. The method as claimed in claim 8 , wherein the first electrode is an anode, the second electrode is a cathode, and the first, second electrodes and the electroluminescent layer form a light emitting element.
14. The method as claimed in claim 8 , wherein the reflection layer has a planar top surface.
15. An image display system, comprising:
an image display device including a display panel, comprising:
a substrate having a luminance region and a none-luminance region thereover;
an interlayer dielectric layer disposed over the substrate;
a reflection layer disposed over the interlayer dielectric layer in the luminance region, wherein the reflection layer does not extend to electrically connect to any other structure;
a planarization layer disposed over the reflection layer, having a rugged top surface corresponding to the reflection layer, wherein the reflection layer is completely electrically insulated from other structure by the planarization layer and the interlayer dielectric layer;
a first electrode disposed over the planarization layer, having a rugged top surface corresponding to the reflection layer;
a pixel defining layer disposed over the planarization layer, exposing the rugged top surface of the first electrode and defining the luminance region; and
an electroluminescent layer and a second electrode sequentially stacked over the first electrode; and
an input unit coupled to the image display device to control the image display device for rendering an image.