Dynamic multipurpose composition for the removal of photoresists and method for its use

1. A method for removing a photoresist from a substrate, the method comprising:

selecting a substrate having a photoresist thereon;

contacting the substrate with a stripper solution for a time sufficient to remove a desired amount of photoresist, wherein the stripper solution consisting essentially of:

from about 55 wt. % to about 90 wt. % dimethyl sulfoxide;

from about 1 wt. % to about 7 wt. % of a quaternary ammonium hydroxide;

from about 1 wt. % to about 75 wt. % of an alkanolamine having at least two carbon atoms, at least one amino substituent and at least one hydroxyl substituent, with the amino and hydroxyl substituents being attached to different carbon atoms; and

from about 0.01 wt. % to about 3 wt. % of a surfactant;

optionally a corrosion inhibitor, water; or a combination thereof; and

from about 2 wt. % to about 35 wt. % of a secondary solvent including a glycol ether compound;

rinsing the stripper solution from the substrate.

2. The method of claim 1 wherein the quaternary ammonium hydroxide has substituents that are (C 1 -C 8 )alkyl, arylalkyl or combinations thereof.

3. The method of claim 1 wherein the quaternary ammonium hydroxide is tetramethylammonium hydroxide.

4. The method of claim 1 wherein the alkanolamine is a compound of the formula:

where R 1 is H, (C 1 -C 4 ) alkyl, or (C 1 -C 4 ) alkylamino.

5. The method of claim 4 wherein R 1 is hydrogen.

6. The method of claim 4 wherein R 1 is CH 2 CH 2 NH 2 .

7. The method of claim 1 wherein the glycol ether compound is diethyleneglycol monomethyl ether.

8. The method of claim 1 wherein said contacting comprises immersing the substrate in the stripper solution.

9. The method of claim 1 wherein the stripper solution is maintained at a temperature of at least about 20° C. during the contacting.

10. The method of claim 9 wherein the stripper solution is maintained at a temperature of at least about 50° C. during the contacting.

11. The method of claim 1 wherein the rinsing is with water.

12. The method of claim 1 wherein the rinsing is with an alcohol.

13. The method of claim 8 wherein said contacting further comprises agitating the stripper solution during the immersing.

14. The method of claim 13 wherein the agitating is accomplished by mechanically stirring the stripper solution, by circulating the stripper solution, or by bubbling an inert gas through the stripper solution.

15. The method of claim 1 , wherein loading capacity of said stripper composition ranges from 15 cm3/liter up to 90 cm3/liter.

16. A method comprising:

selecting a substrate having a photoresist thereon;

contacting the substrate with a stripper solution for a time sufficient to remove a desired amount of photoresist, wherein the stripper solution includes:

from about 20 wt. % to about 90 wt. % dimethyl sulfoxide;

from about 1 wt. % to about 7 wt. % of a quaternary ammonium hydroxide selected from the group consisting of tetramethylammonium hydroxide, benzyltrimethylammonium hydroxide; diethyldimethylammonium hydroxide, methyltriethylammonium hydroxide, or tetrabutylammonium hydroxide; and

from about 1 wt. % to about 75 wt. % of an amine selected from the group consisting of monoethanolamine or aminoethylethanolamine;

rinsing the stripper solution from the substrate.

17. The method of claim 16 , wherein the amine is aminoethylethanolamine and the quaternary ammonium hydroxide is tetramethylammonium hydroxide.

18. The method of claim 16 , wherein the amine is monoethanolamine and the quaternary ammonium hydroxide is tetramethylammonium hydroxide.

19. The method of claim 16 , wherein the solution includes no greater than about 3 wt. % water.

20. The method of claim 16 , wherein the solution includes from about 2 wt. % to about 35 wt. % diethylene glycol monomethyl ether.