Electrophoretic display device and method of manufacturing and repairing the same
View Patent ↗Provided is an electrophoretic display device and a method of manufacturing and repairing the electrophoretic display device. The electrophoretic display device includes: a gate line, a gate electrode, and a common electrode, separated a predetermined distance from the gate line, which are formed on a substrate; a gate insulation layer formed on an overall surface of the substrate including the gate line; a data line configured to define a pixel area by crossing the gate line; a source electrode configured to extend from the data line; a drain electrode separated from a predetermined distance from the source electrode; a protection layer formed on an overall surface of the substrate including the data line, the source electrode, and the drain electrode; a pixel electrode formed on the protection layer and connected to the drain electrode; an electrophoretic film formed on the substrate including the pixel electrode; a common line formed on a boundary portion between the pixel areas and configured to connect the common electrodes formed in the respective pixel areas; and a repair hole formed by removing the protection layer corresponding to the common line to expose the gate insulation layer.
1. An electrophoretic display device comprising:
a gate line, a gate electrode, a common electrode and a common line on a substrate;
a gate insulation layer on the substrate including the gate line;
a data line formed to define a pixel area by crossing the gate line;
a thin film transistor corresponding to the pixel area, the thin film transistor including the gate electrode, a semiconductor layer, and source and drain electrode;
a protection layer on the substrate including the data line, the source electrode, and the drain electrode;
a pixel electrode on the protection layer and connected to the drain electrode;
an electrophoretic film on the substrate including the pixel electrode;
a common line on a boundary portion between the pixel areas and connected the common electrode formed in the pixel area; and
a repair hole formed by removing the protection layer corresponding to the common line to expose the gate insulation layer.
2. The electrophoretic display device claimed as claim 1 , wherein the repair hole is a repair region where a laser beam is emitted when the common electrode is disconnected, and
wherein the laser beam is irradiated onto the gate insulating layer in the repair hole to remove the gate insulating layer and the common layer.
3. The electrophoretic display device claimed as claim 1 , wherein the drain electrode protrudes toward a center portion of the pixel area to form a storage capacitor.
4. The electrophoretic display device claimed as claim 1 , wherein the pixel electrode is overlapped over the gate line and the data line in the pixel area.
5. The electrophoretic display device claimed as claim 1 , wherein the pixel electrode is formed in the repair hole.
6. A method of manufacturing an electrophoretic display device, the method comprising:
forming a gate electrode, a gate line, a common line , and a common electrode on a first substrate;
forming a gate insulation layer on the first substrate on which the gate electrode and the common electrode are formed;
forming a semiconductor pattern, a source electrode, a drain electrode, and a data line on the gate insulation layer;
forming a protection layer on the first substrate on which the source electrode and the drain electrode are formed;
forming a drain contact hole exposes the drain electrode by patterning the protection layer, and simultaneously forming a repair hole for exposing the gate insulation layer by removing the protection layer corresponding to the common line;
forming a pixel electrode which is electrically connected to the drain electrode; and
forming an electrophoretic film on the substrate including the pixel electrode.
7. The method claimed as claim 6 , wherein the repair hole is an area where a laser beam is emitted when the common electrode is disconnected, and
wherein the laser beam is irradiated onto the gate insulating layer in the repair hole to remove the gate insulating layer and the common layer.
8. The method claimed as claim 6 , wherein the common line is connected the common electrode formed at a center portion of each pixel area, and is formed at a boundary portion between the pixel areas.
9. A method of repairing an electrophoretic display device which includes: a gate line, a gate electrode, a common electrode and a common line, on a substrate; a gate insulation layer on the substrate including the gate line; a data line formed to define a pixel area by crossing the gate line; a thin film transistor corresponding to the pixel area, the thin film transistor including the gate electrode, a semiconductor layer, and source and drain electrode; a protection layer on the substrate including the data line, the source electrode, and the drain electrode; a pixel electrode on the protection layer and connected to the drain electrode; an electrophoretic film formed on the substrate including the pixel electrode; a common line on a boundary portion between the pixel areas and connected the common electrode formed in the pixel area; and a repair hole formed by removing the protection layer corresponding to the common line to expose the gate insulation layer,
cutting the gate insulation layer and the common line by irradiating the laser beam onto the gate insulating layer in the repair hole to remove the gate insulating layer and the common layer.
10. The method claimed as claim 9 , wherein the repair hole is an area where a laser beam is emitted when the common electrode is disconnected.
11. The method claimed as claim 9 , wherein the common line is connected the common electrode formed at a center portion of each pixel area, and is formed at a boundary portion between the pixel areas.