IP Library Granted Patent US 8,383,202
Granted Patent B2
US 8,383,202 · App. 12/652,040 · Granted Feb 26, 2013

Method and apparatus for load-locked printing

View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 8,383,202
App. No.
12/652,040
Granted
Feb 26, 2013
Kind
B2
Abstract

The disclosure relates to a method and apparatus for preventing oxidation or contamination during a circuit printing operation. The circuit printing operation can be directed to OLED-type printing. In an exemplary embodiment, the printing process is conducted at a load-locked printer housing having one or more of chambers. Each chamber is partitioned from the other chambers by physical gates or fluidic curtains. A controller coordinates transportation of a substrate through the system and purges the system by timely opening appropriate gates. The controller may also control the printing operation by energizing the print-head at a time when the substrate is positioned substantially thereunder.

Claims (31)

1. A method for depositing an organic material on a substrate, the method comprising the steps of:

receiving the substrate at an inlet chamber;

flooding the inlet chamber with nitrogen, and sealing the inlet chamber;

floating the substrate using a gas bearing;

directing at least a portion of the substrate to a print-head chamber and, while floating the substrate using a combination of pressure and vacuum, discharging a quantity of the organic material from a discharge nozzle onto the portion of the substrate;

directing the substrate to an outlet chamber;

partitioning the print-head chamber from the outlet chamber; and

unloading the substrate from the outlet chamber.

2. The method of claim 1 , further comprising isolating each of the inlet chamber, print-head and outlet chambers from each other using at least one partition.

3. The method of claim 1 , wherein the inlet chamber and the outlet chamber are the same.

4. The method of claim 1 , wherein said step of discharging produces a patterned film on the substrate.

5. A method for depositing an organic material on a substrate, the method comprising the steps of:

receiving the substrate at an inlet chamber;

flooding the inlet chamber with a chamber gas, consisting essentially of nitrogen, and sealing the inlet chamber;

floating the substrate using a gas bearing;

directing at least a portion of the substrate to a print-head chamber and, while floating the substrate using a combination of pressure and vacuum, discharging a quantity of the organic material from a discharge nozzle onto the portion of the substrate, forming a patterned film thereon;

directing the substrate to an outlet chamber;

partitioning the print-head chamber from the outlet chamber; and

unloading the substrate from the outlet chamber.

6. The method of claim 5 , further comprising isolating each of the inlet chamber, print-head and outlet chambers from each other using at least one partition.

7. The method of claim 5 , wherein the inlet chamber and the outlet chamber are the same.

8. A method for depositing an organic material on a substrate, the method comprising the steps of:

receiving the substrate at an inlet chamber;

flooding the inlet chamber with a chamber gas and sealing the inlet chamber;

directing at least a portion of the substrate to a print-head chamber and, while floating and controlling the substrate using the chamber gas and a combination of pressure and vacuum, discharging a quantity of the organic material from a discharge nozzle onto the portion of the substrate, forming a patterned film thereon;

directing the substrate to an outlet chamber;

partitioning the print-head chamber from the outlet chamber; and

unloading the substrate from the outlet chamber.

9. The method of claim 8 , wherein the gas of the chamber gas and the gas bearing is nitrogen.

10. The method of claim 8 , wherein the inlet chamber and the outlet chamber are the same.

11. The method of claim 8 , further comprising isolating each of the inlet chamber, print-head and outlet chambers from each other using at least one partition.

Assignments (7)
SECURITY INTEREST Recorded Apr 19, 2022
From: KATEEVA CAYMAN HOLDING, INC.
To: HB SOLUTION CO., LTD.
Reel/Frame 059727/0111 →
SECURITY INTEREST Recorded Mar 17, 2022
From: KATEEVA, INC.; KATEEVA CAYMAN HOLDING, INC.
To: SINO XIN JI LIMITED
Reel/Frame 059382/0053 →
SECURITY AGREEMENT Recorded Jan 23, 2020
From: KATEEVA, INC.
To: SINO XIN JI LIMITED
Reel/Frame 051682/0212 →
RELEASE OF SECURITY INTEREST Recorded Jan 22, 2020
From: EAST WEST BANK, A CALIFORNIA BANKING CORPORATION
To: KATEEVA, INC.
Reel/Frame 051664/0802 →
SECURITY INTEREST Recorded Apr 4, 2019
From: KATEEVA, INC.
To: EAST WEST BANK
Reel/Frame 048806/0639 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 3, 2015
From: MADIGAN, CONOR
To: KATEEVA, INC.
Reel/Frame 036950/0991 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 10, 2010
From: SOMEKH, SASS; VRONSKY, ELIYAHU
To: KATEEVA, INC.
Reel/Frame 025117/0249 →