Organic light emitting diode display and method of manufacturing the same

1. An organic light emitting diode (OLED) display, comprising:

a substrate member;

a plurality of pixel electrodes on the substrate member;

a pixel defining layer on the substrate member, the pixel defining layer including a pixel defining part and a plurality of light scattering spacer parts, the pixel defining part including a plurality of openings corresponding to and exposing the pixel electrodes, and the light scattering spacer parts protruding upward from the pixel defining part away from the substrate member;

an organic light emitting layer on the pixel electrodes;

a first common electrode on the organic light emitting layer, at least a portion of the first common electrode being on the pixel defining layer to overlap the light scattering spacer parts;

a transmissive film on the first common electrode; and

a second common electrode on the transmissive film, wherein

the light scattering spacer parts of the pixel defining layer protrude above the transmissive film, a thickness of the light scattering spacer parts being greater than a thickness of the transmissive film, the thicknesses being measured along a direction normal to the substrate member, and

the first common electrode and the second common electrode are in contact with each other on the light scattering spacer parts of the pixel defining layer.

2. The OLED display as claimed in claim 1 , wherein one or more of the first common electrode and the second common electrode includes a semi-transmissive film.

3. The OLED display as claimed in claim 2 , wherein the semi-transmissive film includes at least one metal, the metal being one or more of magnesium (Mg), silver (Ag), calcium (Ca), lithium (Li), chromium (Cr), and aluminum (Al).

4. The OLED display as claimed in claim 1 , further comprising a sealing member on the substrate member, the pixel defining layer being between the sealing member and the substrate member, and the light scattering spacer parts of the pixel defining layer maintaining a gap between the substrate member and the sealing member.

5. The OLED display as claimed in claim 4 , wherein the light scattering spacer parts of the pixel defining layer have a shape of a prismoid, a prism, a cone, a cylinder, a hemisphere, or a semi-spheroid.

6. The OLED display as claimed in claim 1 , wherein the transmissive film is directly between the first and second common electrodes.

7. The OLED display as claimed in claim 6 , wherein the first and second common electrodes completely overlap the transmissive film.

8. A method of manufacturing an organic light emitting diode (OLED) display, comprising:

forming a plurality of pixel electrodes on a substrate member;

forming a pixel defining layer on the substrate member, the pixel defining layer including a pixel defining part and a plurality of light scattering spacer parts, the pixel defining part including a plurality of openings corresponding to and exposing the pixel electrodes, and the light scattering spacer parts protruding upward from the pixel defining part away from the substrate member;

forming an organic light emitting layer on the pixel electrodes;

forming a first common electrode on the organic light emitting layer, at least a portion of the first common electrode being on the pixel defining layer to overlap the light scattering spacer parts;

forming a transmissive film on the first common electrode; and

forming a second common electrode on the transmissive film, wherein

the light scattering spacer parts of the pixel defining layer are formed to protrude above the transmissive film at a greater height than that of the transmissive film, and

the first common electrode and the second common electrode are formed to contact each other on the light scattering spacer parts of the pixel defining layer.

9. The method as claimed in claim 8 , wherein forming a pixel defining layer includes patterning a photosensitive material layer on the substrate member by a photolithography process using a mask.

10. The method as claimed in claim 9 , wherein the photolithography process includes a half-tone exposure process.

11. The method as claimed in claim 8 , wherein one or more of the first common electrode and the second common electrode are formed of a semi-transmissive film.

12. The method as claimed in claim 11 , wherein the semi-transmissive film is made of at least one metal, the metal being one or more of magnesium (Mg), silver (Ag), calcium (Ca), lithium (Li), chromium (Cr), and aluminum (Al).

13. The method as claimed in claim 8 , further comprising disposing a sealing member to face the substrate member, with the pixel defining layer interposed therebetween, such that the light scattering spacer parts of the pixel defining layer maintain a gap between the substrate member and the sealing member.

14. The method as claimed in claim 13 , wherein the light scattering spacer parts of the pixel defining layer are formed in a shape of a prismoid, a prism, a cone, a cylinder, a hemisphere, or a semi-spheroid.

15. The method as claimed in claim 13 , wherein the transmissive film is formed directly between the first and second common electrodes.

16. The method as claimed in claim 15 , wherein the first and second common electrodes are formed to completely overlap the transmissive film.