Organic light emitting diode display device having a pixel defining layer and method of fabricating the same

1. An organic light emitting diode (OLED) display device, comprising:

a substrate;

a thin film transistor (TFT) on the substrate, the TFT including a semiconductor layer, a gate electrode, and source and drain electrodes;

a first electrode electrically connected to one of the source and drain electrodes;

a pixel defining layer on the substrate, the pixel defining layer exposing the first electrode and having a reversed trapezoidal shape, such that the pixel defining layer has a lower surface facing the substrate, and an upper surface facing away from the substrate and projecting past the lower surface to form an overhang;

an emitting layer on the exposed first electrode; and

a second electrode on the emitting layer, the second electrode including a first portion that overlaps the upper surface of pixel defining layer, and a second portion that projects past the overhang of the pixel defining layer, wherein the first portion and the second portion are continuous.

2. The OLED display device as claimed in claim 1 , further comprising at least one functional layer between the first and second electrodes, the functional layer being at least one of a hole injection layer, a hole transport layer, an electron blocking layer, a hole blocking layer, an electron transport layer, and an electron injection layer.

3. The OLED display device as claimed in claim 2 , wherein the at least one functional layer is on the first electrode, the at least one functional layer being separated from a corresponding functional layer on an adjacent first electrode.

4. The OLED display device as claimed in claim 2 , wherein the OLED display device includes a plurality of functional layers on the first electrode, the plurality of functional layers being separated from corresponding functional layers on an adjacent first electrode.

5. The OLED display device as claimed in claim 2 , wherein the at least one functional layer includes a first portion on the exposed first electrode and a second portion on the pixel defining layer, the first and second portions of the at least one functional layer being separated from each other.

6. The OLED display device as claimed in claim 5 , wherein the first and second portions of the at least one functional layer are at different heights with respect to the substrate.

7. The OLED display device as claimed in claim 1 , wherein the pixel defining layer includes an opening therethrough to expose the first electrode, at least one surface of the pixel defining layer facing the opening being inclined with respect to the substrate to define the reversed trapezoidal shape of the pixel defining layer.

8. The OLED display device as claimed in claim 1 , wherein a surface of the pixel defining layer facing the substrate is shorter than a surface of the pixel defining layer facing away from the substrate.

9. The OLED display device as claimed in claim 1 , wherein the pixel defining layer includes one or more of an acryl series resin, benzocyclobutene (BCB), and polyimide (PI).

10. A method of fabricating an organic light emitting diode (OLED) display device, comprising:

forming a thin film transistor (TFT) on a substrate, the TFT including a semiconductor layer, a gate electrode, and source and drain electrodes;

forming a first electrode electrically connected to one of the source and drain electrodes;

forming a pixel defining layer on the substrate, the pixel defining layer exposing the first electrode and having a reversed trapezoidal shape, such that the pixel defining layer has a lower surface facing the substrate, and an upper surface facing away from the substrate and projecting past the lower surface to form an overhang;

forming an emitting layer on the exposed first electrode; and

forming a second electrode on the emitting layer, the second electrode including a first portion that overlaps the upper surface of pixel defining layer, and a second portion that projects past the overhang of the pixel defining layer, wherein the first portion and the second portion are continuous.

11. The method as claimed in claim 10 , further comprising forming at least one functional layer between the first and second electrodes, the functional layer being at least one of a hole injection layer, a hole transport layer, an electron blocking layer, a hole blocking layer, an electron transport layer, and an electron injection layer.

12. The method as claimed in claim 11 , wherein the at least one functional layer is formed on the first electrode, such that the at least one functional is separated from a corresponding functional layer on an adjacent first electrode.

13. The method as claimed in claim 11 , wherein forming the at least one functional layer includes forming a first portion on the exposed first electrode and a second portion on the pixel defining layer, the first and second portions of the at least one functional layer being formed at different heights with respect to the substrate.

14. The method as claimed in claim 10 , wherein the pixel defining layer is formed of one or more of an acryl series resin, BCB, and PI.

15. The method as claimed in claim 10 , wherein forming the pixel defining layer includes:

applying a first material to form a pixel defining material layer, the first material including one or more of an acryl series resin, BCB, and PI;

applying a negative photoresist material to the pixel defining material layer to form a negative photoresist layer; and

performing light irradiation, development, and etching processes to a predetermined part of the negative photoresist layer.

16. The method as claimed in claim 15 , wherein the etching process is a wet etching process, and the negative photoresist layer and the pixel defining material layer are over-etched.

17. The method as claimed in claim 15 , further comprising, after the etching process, removing the negative photoresist layer.

18. The method as claimed in claim 10 , wherein forming the pixel defining layer includes:

applying a first material to form a pixel defining material layer;

providing an etch mask adjacent to the pixel defining material layer; and

anisotropically wet etching the pixel defining material layer through the etch mask.

19. The OLED display device as claimed in claim 1 , wherein the second portion of the second electrode includes a portion that extends below the upper surface of the pixel defining layer.

20. The method as claimed in claim 10 , wherein the second portion of the second electrode includes a portion that extends below the upper surface of the pixel defining layer.