Method for forming a patterned layer on a substrate

1. A method for forming a patterned layer on a substrate by means of an imprint process comprising the steps of:

providing a single patterning means;

providing a first layer on a surface of said substrate;

simultaneously forming patterns of recesses in the first layer by imprinting said first layer with said patterning means, wherein said patterns of recesses includes a first pattern of recesses and a second pattern of recesses that are wider than said recesses of said first pattern;

curing said first layer;

performing a first surface treatment onto said first layer to make a surface of the first layer hydrophilic;

performing a second surface treatment onto a selected subarea of the surface of said first layer to make said subarea hydrophobic, said subarea including surface portions between said recesses of said first pattern and excluding said recesses of said first pattern; and

depositing a first conducting pattern material into said recesses of said first pattern and a second conducting pattern material that is different from said first conducting pattern material into said recesses of said second pattern, wherein the first and second conducting pattern materials form a single, cohesive electrode and wherein the chemical composition of said electrode in said recesses of said first pattern is different from the chemical composition of said electrode in said recesses of said second pattern.

2. The method according to claim 1 , further comprising the step of, after curing said first layer:

providing a barrier layer.

3. The method according to claim 1 , wherein the step of depositing said first conducting pattern material into said recesses of said first pattern further comprises performing at least one time the steps of:

depositing a second layer onto said first layer, wherein said second layer contains polar molecules;

allowing said second layer to dry, wherein said second layer is redistributed from said hydrophobic subarea into said recesses of said first pattern.

4. A method according to claim 3 , wherein the step of depositing said second conducting pattern material into said recesses of said second pattern further comprising the steps of:

masking said first and second layers providing unmasked areas;

depositing a third layer onto said unmasked areas.

5. The method according to claim 4 , wherein said third layer is conducting.

6. The method according to claim 4 , wherein said step of depositing a third layer is done by sputtering.

7. The method according to claim 3 , wherein said step of depositing a second layer is done by means of one of spin coating, spray coating, ink jetting, or a doctors blade distribution.

8. The method according to claim 3 , wherein said second layer comprises a metal-containing liquid.

9. The method according to claim 8 , wherein said metal containing liquid contains one of a metal precursor and metal nano particles.

10. The method according to claim 9 , further comprising the steps of, after drying said metal containing liquid:

applying a treatment, wherein said precursors are converted to nucleation sites for deposition of electro-less metal; and

depositing a thin electro-less metal layer on said nucleation sites.

11. The method according to claim 1 , wherein the first layer is a sol-gel material and wherein the method further comprises the step of:

at least partly reacting said sol-gel material before the imprinting.

12. The method according to claim 1 , wherein the first layer comprises a polymer material.

13. The method according to claim 1 , wherein said first surface treatment is one of a UV-ozone treatment, a plasma treatment and a wet chemical oxidation.

14. The method according to claim 1 , wherein said second surface treatment is done by means of applying a reactive hydrophobic precursor.

15. The method according to claim 1 , wherein the second conducting pattern material is transparent.

16. The method according to claim 15 , wherein the first conducting pattern material is composed of an elemental metal and wherein the recesses of said second pattern are disposed between recesses of said first pattern and provide a shunting function for said electrode.

17. A method for forming a patterned layer on a substrate by means of an imprint process comprising the steps of:

providing a single patterning means;

providing a first layer on a surface of said substrate;

simultaneously forming patterns of recesses in the first layer by imprinting said first layer with said patterning means, wherein said patterns of recesses includes a first pattern of recesses and a second pattern of recesses that are wider than said recesses of said first pattern;

curing said first layer;

performing a first surface treatment onto said first layer to make a surface of the first layer hydrophilic;

performing a second surface treatment onto a selected subarea of the surface of said first layer to make said subarea hydrophobic, said subarea including surface portions between said recesses of said first pattern and excluding said recesses of said first pattern; and

depositing a first conducting pattern material into said recesses of said first pattern and a second conducting pattern material that is different from said first conducting pattern material into said recesses of said second pattern, wherein the first and second conducting pattern materials form a single, cohesive electrode,

wherein the step of depositing said first conducting pattern material into said recesses of said first pattern further comprises performing at least one time the steps of:

depositing a second layer onto said first layer, wherein said second layer contains polar molecules, and

allowing said second layer to dry, wherein said second layer is redistributed from said hydrophobic subarea into said recesses of said first pattern, and

wherein the step of depositing said second conducting pattern material into said recesses of said second pattern further comprises the steps of:

masking said first and second layers providing unmasked areas,

depositing a third layer onto said unmasked areas by means of spray pyrolysis of tin/zinc solutions.

18. A method for forming a patterned layer on a substrate by means of an imprint process comprising the steps of:

providing a single patterning means;

providing a first layer on a surface of said substrate;

simultaneously forming patterns of recesses in the first layer by imprinting said first layer with said patterning means, wherein said patterns of recesses includes a first pattern of recesses and a second pattern of recesses that are wider than said recesses of said first pattern;

curing said first layer;

performing a first surface treatment onto said first layer to make a surface of the first layer hydrophilic;

performing a second surface treatment onto a selected subarea of the surface of said first layer to make said subarea hydrophobic, said subarea including surface portions between said recesses of said first pattern and excluding said recesses of said first pattern; and

depositing a first conducting pattern material into said recesses of said first pattern and a second conducting pattern material that is different from said first conducting pattern material into said recesses of said second pattern, wherein the first and second conducting pattern materials form a single, cohesive electrode and wherein the second conducting pattern material is transparent.

19. The method according to claim 18 , wherein the first conducting pattern material is composed of an elemental metal.

20. The method according to claim 19 , wherein the recesses of said second pattern are disposed between recesses of said first pattern and provide a shunting function for said electrode.