Device and method for spinous process distraction
View Patent ↗An implant for maintaining a given minimum inter-spinous-process spacing includes an implant body with a number of segments hingedly interconnected so as to assume a straightened state for delivery along a conduit and a curved deployed state. An elongated tightening element is anchored at the distal segment of the implant body and passes along a channel extending along the implant body. Tension applied to the tightening element biases the implant body from the straightened state to the curved deployed state. Preferably, when the tightening element is deflected to reach the curved deployed state, a locking arrangement locks the tightening element relative to the implant body, thereby retaining the implant in the curved deployed state. A distal portion of the implant body is preferably formed with a set of lateral projections to inhibit withdrawal of the distal portion between adjacent spinous processes after deployment.
1. A spinal implant comprising:
(a) an implant body including a plurality of segments hingedly interconnected so as to assume a straightened state for delivery along a conduit and a curved deployed state, said implant body having a channel passing from a distal one of said segments along a majority of a length of said body; and
(b) an elongated tightening element anchored at said distal segment of said body and passing along said channel,
said body and said tightening element being configured such that tension applied to said tightening element tends to bias said implant body from said straightened state to said curved deployed state,
wherein said implant body and said tightening element are configured to provide a locking arrangement such that, when said tightening element is deflected to reach said curved deployed state, said locking arrangement is effective to lock said tightening element relative to said implant body, thereby retaining said implant in said curved deployed state,
further comprising engagement features associated with said implant body and configured for engaging two adjacent spinous processes, wherein said implant body has a medial portion of a first width for deployment as a spacer between two adjacent spinous processes, and wherein said engagement features are associated with at least a proximal portion of said implant body and span a width greater than said first width so as to laterally engage the spinous processes, thereby limiting movement of said implant body relative to said spinous processes.
2. The implant of claim 1 , wherein said implant body is formed with at least one resilient tooth, and wherein said tightening element is formed with at least one corresponding step, said resilient tooth and said corresponding step together providing said locking arrangement.
3. The implant of claim 1 , wherein said curved deployed form exhibits a substantially U-shaped form.
4. The implant of claim 1 , wherein said engagement features include a set of lateral projections formed at a distal portion of said implant body and configured for inhibiting withdrawal of said distal portion between adjacent regions of spinal tissue after deployment.
5. The implant of claim 4 , wherein said lateral projections provide barbed ridges shaped to inhibit withdrawal of said distal portion between adjacent regions of spinal tissue after deployment.
6. The implant of claim 4 , wherein said set of lateral projections includes projections from a plurality of said segments of said implant body, said projections being spaced apart when said implant body is in said straightened state and being juxtaposed when said implant is in said curved deployed state such that said projections cooperate to form at least one elongated retention feature extending along at least part of at least two of said segments.
7. The implant of claim 6 , wherein said at least one elongated retention feature is a projecting ridge extending substantially perpendicular to a line joining a proximal and a distal end of said implant body.
8. The implant of claim 6 , wherein said at least one elongated retention feature is a barbed ridge shaped to inhibit withdrawal of said distal portion between adjacent regions of spinal tissue after deployment.
9. The implant of claim 6 , wherein said at least one elongated retention feature extends along at least part of at least three of said segments.
10. The implant of claim 4 , wherein said engagement features further comprise a proximal block having a second width greater than said first width.
11. The implant of claim 1 , wherein said implant body is formed primarily from a biocompatible polymer.
12. The implant of claim 1 , wherein said implant body is formed primarily from ultra-high-molecular-weight poly-ethylene.
13. The implant of claim 12 , wherein said tightening element is formed primarily from ultra-high-molecular-weight poly-ethylene.
14. An implant system comprising:
(a) the implant of claim 1 ; and
(b) a delivery system including:
(i) a conduit sized to receive said implant and to maintain said implant body in said straightened state,
(ii) a pusher deployable at least partially within said conduit to advance said implant so as to emerge from a distal opening of said conduit, and
(iii) a biasing arrangement associated with said tightening element and deployed to urge said tightening element rearward such that, as said implant emerges from said distal end of said conduit, said implant body is progressively deflected towards said curved deployed state.
15. The implant system of claim 14 , wherein said delivery system further includes a cutting mechanism selectively deployable to sever an excess length of said tightening element after locking of said locking arrangement.
16. A spinal implant comprising:
(a) an implant body including a plurality of segments hingedly interconnected so as to assume a straightened state for delivery along a conduit and a curved deployed state, said implant body having a channel passing from a distal one of said segments along a majority of a length of said body;
(b) an elongated tightening element anchored at said distal segment of said body and passing along said channel; and
(c) engagement features associated with said implant body and configured for engaging two adjacent spinous processes,
wherein said implant body has a medial portion of a first width for deployment as a spacer between two adjacent spinous processes, and wherein said engagement features are associated with a proximal portion and a distal portion of said implant body and span a width greater than said first width so as to laterally engage the spinous processes, thereby limiting movement of said implant body relative to said spinous processes,
said body and said tightening element being configured such that tension applied to said tightening element tends to bias said implant body from said straightened state to said curved deployed state,
wherein said engagement features include a set of lateral projections formed at a distal portion of said implant body and configured for inhibiting withdrawal of said distal portion between adjacent regions of spinal tissue after deployment.
17. The implant of claim 16 , wherein said lateral projections provide barbed ridges shaped to inhibit withdrawal of said distal portion between adjacent regions of spinal tissue after deployment.
18. The implant of claim 16 , wherein said set of lateral projections includes projections from a plurality of said segments of said implant body, said projections being spaced apart when said implant body is in said straightened state and being juxtaposed when said implant is in said curved deployed state such that said projections cooperate to form at least one elongated retention feature extending along at least part of at least two of said segments.
19. The implant of claim 18 , wherein said at least one elongated retention feature is a projecting ridge extending substantially perpendicular to a line joining a proximal and a distal end of said implant body.
20. The implant of claim 18 , wherein said at least one elongated retention feature is a barbed ridge shaped to inhibit withdrawal of said distal portion between adjacent regions of spinal tissue after deployment.
21. The implant of claim 18 , wherein said at least one elongated retention feature extends along at least part of at least three of said segments.
22. The implant of claim 16 , wherein said engagement features further comprise a proximal block having a second width greater than said first width.
23. The implant of claim 16 , wherein said curved deployed form exhibits a substantially U-shaped form.
24. A spinal implant comprising:
(a) an implant body including a plurality of segments hingedly interconnected so as to assume a straightened state for introduction into a body and a curved deployed state; and
(b) engagement features associated with said implant body and configured for engaging two adjacent spinous processes,
wherein said implant body has a medial portion of a first width for deployment as a spacer between two adjacent spinous processes, and wherein said engagement features are associated with at least a proximal portion of said implant body and span a width greater than said first width so as to laterally engage the spinous processes, thereby limiting movement of said implant body relative to the adjacent spinous processes.